scholarly journals High-power EUV lithography: spectral purity and imaging performance

2020 ◽  
Vol 19 (03) ◽  
Author(s):  
Mark van de Kerkhof ◽  
Fei Liu ◽  
Marieke Meeuwissen ◽  
Xueqing Zhang ◽  
Muharrem Bayraktar ◽  
...  
Keyword(s):  
High Power ◽  
Spectral Purity ◽  
Euv Lithography ◽  
Imaging Performance

scholarly journals High power and spectral purity continuous-wave photonic THz source tunable from 1 to 4.5 THz for nonlinear molecular spectroscopy

2013 ◽  
Vol 15 (10) ◽  
pp. 105014 ◽  
Author(s):  
J Kiessling ◽  
I Breunig ◽  
P G Schunemann ◽  
K Buse ◽  
K L Vodopyanov
Keyword(s):  
High Power ◽  
Continuous Wave ◽  
Molecular Spectroscopy ◽  
Spectral Purity

High-Power, High-Repetition-Rate Pulsed CO2 Lasers and their application in EUV lithography sources

2016 ◽  
Author(s):  
Yezheng Tao ◽  
Alex Schafgans ◽  
Slava Rokitski ◽  
Michael Kats ◽  
Jayson Stewart ◽  
...  
Keyword(s):  
High Power ◽  
Repetition Rate ◽  
High Repetition Rate ◽  
Co2 Lasers ◽  
High Repetition ◽  
Euv Lithography

High-power EUV lithography sources based on gas discharges and laser-produced plasmas

2003 ◽  
Author(s):  
Uwe Stamm ◽  
Imtiaz Ahmad ◽  
Istvan Balogh ◽  
H. Birner ◽  
D. Bolshukhin ◽  
...  
Keyword(s):  
High Power ◽  
Gas Discharges ◽  
Euv Lithography

Resist outgassing characterization for qualification in high power EUV lithography

2012 ◽  
Author(s):  
Toshiya Takahashi ◽  
Norihiko Sugie ◽  
Kazuhiro Katayama ◽  
Isamu Takagi ◽  
Yukiko Kikuchi ◽  
...  
Keyword(s):  
High Power ◽  
Euv Lithography

High-power, high-spectral-purity GaSb-based laterally coupled distributed feedback lasers with metal gratings emitting at 2 μm

2019 ◽  
Vol 114 (2) ◽  
pp. 021102 ◽  
Author(s):  
Cheng-Ao Yang ◽  
Sheng-Wen Xie ◽  
Yi Zhang ◽  
Jin-Ming Shang ◽  
Shu-Shan Huang ◽  
...  
Keyword(s):  
High Power ◽  
Distributed Feedback ◽  
Distributed Feedback Lasers ◽  
Spectral Purity ◽  
Metal Gratings

High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography

1999 ◽  
Author(s):  
William T. Silfvast ◽  
M. Klosner ◽  
Gregory M. Shimkaveg ◽  
Howard Bender ◽  
Glenn D. Kubiak ◽  
...  
Keyword(s):  
High Power ◽  
Plasma Discharge ◽  
Discharge Source ◽  
Euv Lithography

Theoretical efficiency analysis of a condenser-embedded grating-based spectral purity filter for EUV lithography

2002 ◽  
Vol 214 (1-6) ◽  
pp. 31-38 ◽  
Author(s):  
Patrick P Naulleau ◽  
William C Sweatt ◽  
Daniel A Tichenor
Keyword(s):  
Efficiency Analysis ◽  
Spectral Purity ◽  
Euv Lithography
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