Temperature dependence of quantum efficiency enhancement using plasmonic gratings on nBn detectors with thin absorbers

2019 ◽  
Vol 13 (04) ◽  
pp. 1
Author(s):  
Jill A. Nolde ◽  
Eric M. Jackson ◽  
Mijin Kim ◽  
Chul Soo Kim ◽  
Chadwick L. Canedy ◽  
...  
2015 ◽  
Vol 106 (26) ◽  
pp. 261109 ◽  
Author(s):  
Jill A. Nolde ◽  
Mijin Kim ◽  
Chul Soo Kim ◽  
Eric M. Jackson ◽  
Chase T. Ellis ◽  
...  

2021 ◽  
pp. 545-564
Author(s):  
Reddy Kunda Siri Kiran Janardhana ◽  
Raju Kumar ◽  
Tata Narsinga Rao ◽  
Srinivasan Anandan

AIP Advances ◽  
2015 ◽  
Vol 5 (9) ◽  
pp. 097169 ◽  
Author(s):  
Daisuke Iida ◽  
Ahmed Fadil ◽  
Yuntian Chen ◽  
Yiyu Ou ◽  
Oleksii Kopylov ◽  
...  

2019 ◽  
Vol 216 (23) ◽  
pp. 1900501 ◽  
Author(s):  
Hisato Yamaguchi ◽  
Fangze Liu ◽  
Jeffrey DeFazio ◽  
Mengjia Gaowei ◽  
Lei Guo ◽  
...  

2018 ◽  
Vol 57 (13) ◽  
pp. 3372 ◽  
Author(s):  
Koji Nagano ◽  
Antonio Perreca ◽  
Koji Arai ◽  
Rana X Adhikari

1987 ◽  
Vol 97 ◽  
Author(s):  
Gerhard Pensl ◽  
Reinhard Helbig ◽  
Hong Zhang ◽  
Gonther Ziegler ◽  
Peter Lanig

ABSTRACTIon implantation of 14N and Rapid Isothermal Annealing (RIA) were employed to achieve n-type doping in epitaxial-grown 6H-SiC layers. The electrical properties of the implanted films were investigated by Hall effect measurements in order to optimize the annealing parameters. In comparison with standard furnace annealing (1470°C/7min), the annealing parameters for the RIA process could be considerably reduced (1050°C/4min). Based on planar technique, implanted p-n junctions were fabricated. The temperature dependence of I-V characteristics and of the quantum efficiency of photodiodes were studied. The maximum of the quantum efficiency at γ=330 nm reaches values of 35% at 400°C.


1999 ◽  
Vol 38 (Part 1, No. 1B) ◽  
pp. 585-588 ◽  
Author(s):  
Takashi Kojima ◽  
Hiroyuki Nakaya ◽  
Suguru Tanaka ◽  
Hideo Yasumoto ◽  
andShigehisa Arai

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