scholarly journals Illumination system with freeform fly’s eye to generate pixelated pupil prescribed by source-mask optimization in extreme ultraviolet lithography

2017 ◽  
Vol 56 (6) ◽  
pp. 065101 ◽  
Author(s):  
Jiahua Jiang ◽  
Qiuli Mei ◽  
Yanqiu Li ◽  
Yan Liu
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Illumination System

Fabrication of a fly-eye mirror for an extreme-ultraviolet lithography illumination system

2001 ◽  
Author(s):  
Hideo Takino ◽  
Teruki Kobayashi ◽  
Norio Shibata ◽  
Masaaki Kuki ◽  
Akinori Itoh ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Illumination System ◽  
Fly Eye

Illumination system design for a three-aspherical-mirror projection camera for extreme-ultraviolet lithography

2000 ◽  
Vol 39 (19) ◽  
pp. 3253
Author(s):  
Yanqiu Li ◽  
Hiroo Kinoshita ◽  
Takeo Watanabe ◽  
Shigeo Irie ◽  
Shigeru Shirayone ◽  
...  
Keyword(s):  
System Design ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Illumination System ◽  
Aspherical Mirror

High-power source and illumination system for extreme ultraviolet lithography

1999 ◽  
Author(s):  
Glenn D. Kubiak ◽  
Luis J. Bernardez II ◽  
Kevin D. Krenz ◽  
William C. Replogle ◽  
William C. Sweatt ◽  
...  
Keyword(s):  
High Power ◽  
Extreme Ultraviolet ◽  
Power Source ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Illumination System
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