Patterning performance of chemically amplified resist in EUV lithography

2016 ◽  
Author(s):  
Tatsuya Fujii ◽  
Shogo Matsumaru ◽  
Tomotaka Yamada ◽  
Yoshitaka Komuro ◽  
Daisuke Kawana ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Euv Lithography ◽  
Chemically Amplified Resist

scholarly journals Reduction of the Outgassing Segment in Acetal based Chemically Amplified Resist for EUV Lithography

2006 ◽  
Vol 19 (4) ◽  
pp. 533-538 ◽  
Author(s):  
Seiya Masuda ◽  
Yasutomo Kawanishi ◽  
Shuuji Hirano ◽  
Sou Kamimura ◽  
Kazuyoshi Mizutani ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Euv Lithography ◽  
Chemically Amplified Resist

The material design to reduce outgassing in acetal-based chemically amplified resist for EUV lithography

2006 ◽  
Author(s):  
Seiya Masuda ◽  
Yasutomo Kawanishi ◽  
Shuuji Hirano ◽  
Sou Kamimura ◽  
Kazuyoshi Mizutani ◽  
...  
Keyword(s):  
Material Design ◽  
Chemically Amplified ◽  
Euv Lithography ◽  
Chemically Amplified Resist

scholarly journals Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

2016 ◽  
Author(s):  
Seiji Nagahara ◽  
Michael Carcasi ◽  
Hisashi Nakagawa ◽  
Elizabeth Buitrago ◽  
Oktay Yildirim ◽  
...  
Keyword(s):  
Trade Off ◽  
Chemically Amplified ◽  
Euv Lithography ◽  
Flood Exposure ◽  
Chemically Amplified Resist

Chemically amplified resist technology for i-line applications

1998 ◽  
Author(s):  
Medhat A. Toukhy ◽  
Sanjay Malik ◽  
Andrew J. Blakeney ◽  
Karin R. Schlicht
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography

2000 ◽  
Author(s):  
Takeo Watanabe ◽  
Hiroo Kinoshita ◽  
Atsushi Miyafuji ◽  
Shigeo Irie ◽  
Shigeru Shirayone ◽  
...  
Keyword(s):  
Single Layer ◽  
Chemically Amplified ◽  
Euv Lithography

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Postexposure Delay Effect on Linewidth Variation in Base Added Chemically Amplified Resist

2000 ◽  
Vol 147 (10) ◽  
pp. 3833 ◽  
Author(s):  
Chin-Yu Ku ◽  
Jia-Min Shieh ◽  
Tsann-Bim Chiou ◽  
Hwang-Kuen Lin ◽  
Tan Fu Lei
Keyword(s):  
Delay Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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