Reduction of the Outgassing Segment in Acetal based Chemically Amplified Resist for EUV Lithography
2006 ◽
Vol 19
(4)
◽
pp. 533-538
◽
Seiya Masuda
◽
Yasutomo Kawanishi
◽
Shuuji Hirano
◽
Sou Kamimura
◽
Kazuyoshi Mizutani
◽
...
Tatsuya Fujii
◽
Shogo Matsumaru
◽
Tomotaka Yamada
◽
Yoshitaka Komuro
◽
Daisuke Kawana
◽
...
Seiji Nagahara
◽
Michael Carcasi
◽
Gosuke Shiraishi
◽
Hisashi Nakagawa
◽
Satoshi Dei
◽
...
T. Watanabe
◽
H. Hada
◽
Seung Yoon Lee
◽
H. Kinoshita
◽
K. Hamamoto
◽
...
Seiya Masuda
◽
Yasutomo Kawanishi
◽
Shuuji Hirano
◽
Sou Kamimura
◽
Kazuyoshi Mizutani
◽
...
Seiji Nagahara
◽
Michael Carcasi
◽
Hisashi Nakagawa
◽
Elizabeth Buitrago
◽
Oktay Yildirim
◽
...
Medhat A. Toukhy
◽
Sanjay Malik
◽
Andrew J. Blakeney
◽
Karin R. Schlicht
1991 ◽
Vol 9
(6)
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pp. 3380
◽
Takeo Watanabe
◽
Hiroo Kinoshita
◽
Atsushi Miyafuji
◽
Shigeo Irie
◽
Shigeru Shirayone
◽
...
Zheng Cui
◽
R. A. Moody
◽
Ian M. Loader
◽
John G. Watson
◽
Philip D. Prewett
2000 ◽
Vol 147
(10)
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pp. 3833
◽
Chin-Yu Ku
◽
Jia-Min Shieh
◽
Tsann-Bim Chiou
◽
Hwang-Kuen Lin
◽
Tan Fu Lei