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ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance
Optical Microlithography XXXIV
◽
10.1117/12.2583729
◽
2021
◽
Author(s):
Toshihiro Oga
◽
Shinichi Matsumoto
◽
Taku Yamazaki
◽
Takeshi Ohta
◽
Satoru Bushida
Keyword(s):
Next Generation
◽
Immersion Lithography
Download Full-text
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High Refractive Index Fluid for Next Generation ArF Immersion Lithography
Journal of Photopolymer Science and Technology
◽
10.2494/photopolymer.19.641
◽
2006
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Vol 19
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◽
pp. 641-646
◽
Cited By ~ 2
Author(s):
Taiichi Furukawa
◽
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...
Keyword(s):
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Next Generation
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Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes
Optical Microlithography XXXI
◽
10.1117/12.2297316
◽
2018
◽
Author(s):
Hirotaka Miyamoto
◽
Hiroshi Furusato
◽
Keisuke Ishida
◽
Hiroaki Tsushima
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Akihiko Kurosu
◽
...
Keyword(s):
Leading Edge
◽
Next Generation
◽
Immersion Lithography
◽
Laser Technologies
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Arf Laser
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High refractive index materials design for the next generation ArF immersion lithography
10.1117/12.771122
◽
2008
◽
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Author(s):
Taiichi Furukawa
◽
Takanori Kishida
◽
Kyouyuu Yasuda
◽
Tsutomu Shimokawa
◽
Zhi Liu
◽
...
Keyword(s):
Refractive Index
◽
Materials Design
◽
High Refractive Index
◽
Next Generation
◽
Immersion Lithography
Download Full-text
The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations
10.1117/12.2219379
◽
2016
◽
Cited By ~ 1
Author(s):
Keisuke Ishida
◽
Takeshi Ohta
◽
Hirotaka Miyamoto
◽
Takahito Kumazaki
◽
Hiroaki Tsushima
◽
...
Keyword(s):
Next Generation
◽
Immersion Lithography
◽
Arf Laser
Download Full-text
High-refractive-index fluids for the next-generation ArF immersion lithography
10.1117/12.656022
◽
2006
◽
Cited By ~ 4
Author(s):
Yong Wang
◽
Takashi Miyamatsu
◽
Taiichi Furukawa
◽
Kinji Yamada
◽
Tetsuo Tominaga
◽
...
Keyword(s):
Refractive Index
◽
High Refractive Index
◽
Next Generation
◽
Immersion Lithography
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120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography
10.1117/12.2085631
◽
2015
◽
Author(s):
Takeshi Ohta
◽
Keisuke Ishida
◽
Takahito Kumazaki
◽
Hiroaki Tsushima
◽
Akihiko Kurosu
◽
...
Keyword(s):
Next Generation
◽
Immersion Lithography
◽
Arf Laser
◽
High Wavelength
Download Full-text
Next generation ArF lightsource "T65A" for cutting-edge immersion lithography providing both high in productivity and performance (Conference Presentation)
Optical Microlithography XXXII
◽
10.1117/12.2515653
◽
2019
◽
Author(s):
Tommy Oga
◽
Taku Yamazaki
◽
Takeshi Ohta
◽
Hiroaki Tsushima
◽
Satoru Bushida
Keyword(s):
Cutting Edge
◽
Next Generation
◽
Immersion Lithography
◽
And Performance
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Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography
10.1117/12.2257960
◽
2017
◽
Author(s):
Hiroshi Furusato
◽
Takahito Kumazaki
◽
Takeshi Ohta
◽
Hiroaki Tsushima
◽
Akihiko Kurosu
◽
...
Keyword(s):
Excimer Laser
◽
Spectral Bandwidth
◽
Next Generation
◽
Immersion Lithography
◽
Arf Excimer Laser
Download Full-text
The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes
10.1117/12.2257959
◽
2017
◽
Author(s):
Hirotaka Miyamoto
◽
Takahito Kumazaki
◽
Hiroaki Tsushima
◽
Akihiko Kurosu
◽
Takeshi Ohta
◽
...
Keyword(s):
Leading Edge
◽
Next Generation
◽
Immersion Lithography
◽
Arf Laser
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Evaluation of Next Generation Fluids for ArF Immersion Lithography Beyond Water
Journal of Photopolymer Science and Technology
◽
10.2494/photopolymer.20.729
◽
2007
◽
Vol 20
(5)
◽
pp. 729-738
◽
Cited By ~ 7
Author(s):
Hoang Tran
◽
Roger H. French
◽
Douglas J. Adelman
◽
Jerald Feldman
◽
Weiming Qiu
◽
...
Keyword(s):
Next Generation
◽
Immersion Lithography
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