Advanced e-beam lithography system JBX-9000MV for 180-nm masks

1999 ◽  
Author(s):  
Hitoshi Takemura ◽  
Tadashi Komagata ◽  
Yasutoshi Nakagawa ◽  
Kazumitsu Tanaka
Keyword(s):  
Lithography System

Subhalf-micron lithography system with phase-shifting effect

1992 ◽  
Author(s):  
Miyoko Noguchi ◽  
Masato Muraki ◽  
Yuichi Iwasaki ◽  
Akiyoshi Suzuki
Keyword(s):  
Phase Shifting ◽  
Lithography System

Maskless ion beam lithography system

1999 ◽  
Vol 46 (1-4) ◽  
pp. 469-472 ◽  
Author(s):  
Y. Lee ◽  
R.A. Gough ◽  
T.J. King ◽  
Q. Ji ◽  
K.N. Leung ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Lithography ◽  
Lithography System

Flexible devices fabricated by a plate-to-roll nanoimprint lithography system

2018 ◽  
Vol 30 (7) ◽  
pp. 075301 ◽  
Author(s):  
Kai Xu ◽  
Huiwen Luo ◽  
Jin Qin ◽  
Muyi Yang ◽  
Songpo Guo ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Flexible Devices ◽  
Lithography System

Analysis and correction of the distortion error in a DMD based scanning lithography system

2019 ◽  
Vol 434 ◽  
pp. 1-6 ◽  
Author(s):  
Qian-Kun Li ◽  
Yao Xiao ◽  
Hua Liu ◽  
Hao-Lin Zhang ◽  
Jia Xu ◽  
...  
Keyword(s):  
Lithography System

X-ray lithography system for submicron device fabrication

1982 ◽  
Author(s):  
B. Fay ◽  
A. Cornette ◽  
J.P. Nivoliers
Keyword(s):  
Device Fabrication ◽  
X Ray ◽  
Lithography System
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