Near-field simulations and measurements of surface plasmons on perforated metallic thin films

2002 ◽  
Author(s):  
Hsia Y. Lin ◽  
Nien H. Lu ◽  
Wei-Chih Liu ◽  
Din Ping Tsai
Keyword(s):  
Thin Films ◽  
Surface Plasmons ◽  
Near Field ◽  
Metallic Thin Films

scholarly journals Near-Field Interactions between Metal Nanoparticle Surface Plasmons and Molecular Excitons in Thin-Films. Part I: Absorption

2012 ◽  
Vol 116 (45) ◽  
pp. 24206-24214 ◽  
Author(s):  
Bjoern Niesen ◽  
Barry P. Rand ◽  
Pol Van Dorpe ◽  
David Cheyns ◽  
Honghui Shen ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Plasmons ◽  
Near Field ◽  
Metal Nanoparticle ◽  
Nanoparticle Surface ◽  
Molecular Excitons

Near-Field Interactions between Metal Nanoparticle Surface Plasmons and Molecular Excitons in Thin-Films. Part II: Emission

2012 ◽  
Vol 116 (45) ◽  
pp. 24215-24223 ◽  
Author(s):  
Bjoern Niesen ◽  
Barry P. Rand ◽  
Pol Van Dorpe ◽  
David Cheyns ◽  
Eduard Fron ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Plasmons ◽  
Near Field ◽  
Metal Nanoparticle ◽  
Nanoparticle Surface ◽  
Molecular Excitons

Nondestructive and Non-Contact Characterization Technique for Metal Thin Films Using a Near-Field Microwave Microprobe

2006 ◽  
Vol 321-323 ◽  
pp. 1457-1460 ◽  
Author(s):  
Hyun Jun Yoo ◽  
Jong Chel Kim ◽  
Arsen Babajayan ◽  
Song Hui Kim ◽  
Kie Jin Lee
Keyword(s):  
Thin Films ◽  
Surface Resistance ◽  
Near Field ◽  
Regulation System ◽  
Metallic Thin Films ◽  
Metal Thin Films ◽  
Microwave Characterization ◽  
Distance Regulation ◽  
Near Field Scanning ◽  
Nondestructive Characterization

We observed the surface resistance of metal thin films by a nondestructive characterization method using a near-field scanning microwave microprobe (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system. To demonstrate the ability of local microwave characterization, the surface resistance dependence of the metallic thin films has been mapped nondestructively.

Rocking Beam Microarea Diffraction Applied to Metallic thin Films

1976 ◽  
Vol 34 ◽  
pp. 396-397
Author(s):  
R. H. Geiss
Keyword(s):  
Thin Films ◽  
Electron Diffraction ◽  
Small Area ◽  
Objective Lens ◽  
Electron Optics ◽  
Metallic Thin Films ◽  
Transmission Electron Diffraction ◽  
Transmission Electron ◽  
Sample Height ◽  
Scanning Transmission

The theory and practical limitations of micro area scanning transmission electron diffraction (MASTED) will be presented. It has been demonstrated that MASTED patterns of metallic thin films from areas as small as 30 Åin diameter may be obtained with the standard STEM unit available for the Philips 301 TEM. The key to the successful application of MASTED to very small area diffraction is the proper use of the electron optics of the STEM unit. First the objective lens current must be adjusted such that the image of the C2 aperture is quasi-stationary under the action of the rocking beam (obtained with 40-80-160 SEM settings of the P301). Second, the sample must be elevated to coincide with the C2 aperture image and its image also be quasi-stationary. This sample height adjustment must be entirely mechanical after the objective lens current has been fixed in the first step.

PHOTOEMISSION FROM THE DECAY OF SURFACE PLASMONS IN THIN FILMS OF Al

1973 ◽  
Vol 34 (C6) ◽  
pp. C6-95-C6-95
Author(s):  
T. A. CALLCOTT ◽  
E. T. ARAKAWA
Keyword(s):  
Thin Films ◽  
Surface Plasmons
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