Application of discrete layer peeling algorithm for design of selective photonic devices obeying the constraints of the fabrication process

2008 ◽  
Author(s):  
Marcin Wielichowski ◽  
Sergiusz Patela
Keyword(s):  
Photonic Devices ◽  
Fabrication Process ◽  
Layer Peeling ◽  
Discrete Layer

Direct design of super-narrowband fiber grating filter with discrete layer-peeling algorithm

2008 ◽  
Author(s):  
Peng Chen ◽  
Rong Wang ◽  
Tao Pu ◽  
Lin Lu ◽  
Yingxun Zhu ◽  
...  
Keyword(s):  
Fiber Grating ◽  
Direct Design ◽  
Layer Peeling ◽  
Discrete Layer

Process Modeling, Optimization and Characterization of Silicon Optical Waveguides by Anisotropic Wet Etching

2011 ◽  
Vol 403-408 ◽  
pp. 4295-4299
Author(s):  
H. Hazura ◽  
A.R. Hanim ◽  
B. Mardiana ◽  
Sahbudin Shaari ◽  
P.S. Menon
Keyword(s):  
Optical Waveguide ◽  
Optical Waveguides ◽  
Photonic Devices ◽  
Wet Etching ◽  
Fabrication Process ◽  
Etching Time ◽  
Optical Modulators ◽  
Silicon Waveguide ◽  
Simulation And Experiment ◽  
Silicon Based

We present a detailed fabrication process of silicon optical waveguide with a depth of 4μm via simulation and experiment. An anisotropic wet etching using Potassium Hydroxide (KOH) solutions was selected to study the influence of major fabrication parameters such as etch rate, oxidation time and development time to the fabrication performance. The fabrication of the silicon waveguide with the orientation of was modeled using ATHENA from 2D Silvaco software and was later compared with the actual fabricated device. Etching time of 4 minutes was required to etch the Si to the depth of 4μm to obtain a perfectly trapeizoidal optical waveguide structure. Our results show that the simulation model is trustworthy to predict the performance of the practical anisotropic wet etching fabrication process. The silicon-based waveguide components are targeted to be employed in realizing future photonic devices such as optical modulators.

Synthesis of chirped quasi-phase-matching grating by discrete layer-peeling method

2010 ◽  
Author(s):  
Qianwu Zhang ◽  
Xianglong Zeng ◽  
Fufei Pang ◽  
Yunqi Liu ◽  
Tingyun Wang
Keyword(s):  
Phase Matching ◽  
Quasi Phase Matching ◽  
Layer Peeling ◽  
Discrete Layer

scholarly journals Numerically extrapolated discrete layer-peeling algorithm for synthesis of nonuniform fiber Bragg gratings

2011 ◽  
Vol 19 (9) ◽  
pp. 8254 ◽  
Author(s):  
Youngchol Choi ◽  
Joohwan Chun ◽  
Jinho Bae
Keyword(s):  
Fiber Bragg Gratings ◽  
Bragg Gratings ◽  
Layer Peeling ◽  
Discrete Layer

PPLN Poling Design Based on a Discrete Layer Peeling Algorithm Combined With a Deleted-Reversal Method

2013 ◽  
Vol 31 (23) ◽  
pp. 3892-3900 ◽  
Author(s):  
A. A. C. Albuquerque ◽  
B. J. Puttnam ◽  
M. V. Drummond ◽  
S. Shinada ◽  
N. Wada ◽  
...  
Keyword(s):  
Layer Peeling ◽  
Discrete Layer

Synthesis of chirped quasi-phase-matching grating by discrete layer-peeling method

2010 ◽  
Author(s):  
Qianwu Zhang ◽  
Xianglong Zeng ◽  
Fufei Pang ◽  
Yunqi Liu ◽  
Tingyun Wang
Keyword(s):  
Phase Matching ◽  
Quasi Phase Matching ◽  
Layer Peeling ◽  
Discrete Layer

Improved Discrete Layer-peeling Method for the Reconfiguration of Multi-channel Fiber Bragg Grating

2011 ◽  
Vol 40 (4) ◽  
pp. 505-508
Author(s):  
柏青 BAI Qing ◽  
冯德军 FENG De-jun
Keyword(s):  
Fiber Bragg Grating ◽  
Bragg Grating ◽  
Layer Peeling ◽  
Discrete Layer

Optimization of Silicon-Based Fabrication Process Modeling for Optical Modulator

2016 ◽  
Vol 846 ◽  
pp. 230-236
Author(s):  
Hazura Haroon ◽  
Hanim Abdul Razak ◽  
Anis Suhaila Mohd Zain ◽  
Najimiah Radiah Mohamad
Keyword(s):  
Process Modeling ◽  
Photonic Devices ◽  
Fabrication Process ◽  
Taguchi Methods ◽  
Optical Modulator ◽  
Optical Modulators ◽  
Wide Range ◽  
Diffusion Temperature ◽  
Silicon Based ◽  
Fabrication Parameters

Silicon-based photonic devices have emerged as a high demand technology for a wide range of applications. Most of these devices can be realized by optical waveguides where it forms the basic structure for device construction. This project involved the optimization of silicon waveguide fabrication process modeling using Silvaco. The optimized silicon-based waveguide components are aimed to be implemented in future photonic devices such as optical modulators. The Taguchi methods are employed to study the influence of fabrication parameters variations on the fabrication performance such as etch rate and waveguide structure. Four fabrication parameters are investigated includes the diffusion temperature of the N - type channel, diffusion temperature of the P - type channel, silicon orientation and oxide thickness. The result shows that the temperature during the diffusion on an N - type channel has the most influence on the performance of the modulation efficiency of the silicon optical waveguide.

Synthesis of chirped quasi-phase-matching grating by discrete layer-peeling method

2010 ◽  
Author(s):  
Qianwu Zhang ◽  
Xianglong Zeng ◽  
Fufei Pang ◽  
Yunqi Liu ◽  
Tingyun Wang
Keyword(s):  
Phase Matching ◽  
Quasi Phase Matching ◽  
Layer Peeling ◽  
Discrete Layer
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