Process Modeling, Optimization and Characterization of Silicon Optical Waveguides by Anisotropic Wet Etching

2011 ◽  
Vol 403-408 ◽  
pp. 4295-4299
Author(s):  
H. Hazura ◽  
A.R. Hanim ◽  
B. Mardiana ◽  
Sahbudin Shaari ◽  
P.S. Menon
Keyword(s):  
Optical Waveguide ◽  
Optical Waveguides ◽  
Photonic Devices ◽  
Wet Etching ◽  
Fabrication Process ◽  
Etching Time ◽  
Optical Modulators ◽  
Silicon Waveguide ◽  
Simulation And Experiment ◽  
Silicon Based

We present a detailed fabrication process of silicon optical waveguide with a depth of 4μm via simulation and experiment. An anisotropic wet etching using Potassium Hydroxide (KOH) solutions was selected to study the influence of major fabrication parameters such as etch rate, oxidation time and development time to the fabrication performance. The fabrication of the silicon waveguide with the orientation of was modeled using ATHENA from 2D Silvaco software and was later compared with the actual fabricated device. Etching time of 4 minutes was required to etch the Si to the depth of 4μm to obtain a perfectly trapeizoidal optical waveguide structure. Our results show that the simulation model is trustworthy to predict the performance of the practical anisotropic wet etching fabrication process. The silicon-based waveguide components are targeted to be employed in realizing future photonic devices such as optical modulators.

Optimization of Silicon-Based Fabrication Process Modeling for Optical Modulator

2016 ◽  
Vol 846 ◽  
pp. 230-236
Author(s):  
Hazura Haroon ◽  
Hanim Abdul Razak ◽  
Anis Suhaila Mohd Zain ◽  
Najimiah Radiah Mohamad
Keyword(s):  
Process Modeling ◽  
Photonic Devices ◽  
Fabrication Process ◽  
Taguchi Methods ◽  
Optical Modulator ◽  
Optical Modulators ◽  
Wide Range ◽  
Diffusion Temperature ◽  
Silicon Based ◽  
Fabrication Parameters

Silicon-based photonic devices have emerged as a high demand technology for a wide range of applications. Most of these devices can be realized by optical waveguides where it forms the basic structure for device construction. This project involved the optimization of silicon waveguide fabrication process modeling using Silvaco. The optimized silicon-based waveguide components are aimed to be implemented in future photonic devices such as optical modulators. The Taguchi methods are employed to study the influence of fabrication parameters variations on the fabrication performance such as etch rate and waveguide structure. Four fabrication parameters are investigated includes the diffusion temperature of the N - type channel, diffusion temperature of the P - type channel, silicon orientation and oxide thickness. The result shows that the temperature during the diffusion on an N - type channel has the most influence on the performance of the modulation efficiency of the silicon optical waveguide.

scholarly journals Optical waveguides based on one-dimensional organic crystals

PhotoniX ◽  
2021 ◽  
Vol 2 (1) ◽  
Author(s):  
Song Chen ◽  
Ming-Peng Zhuo ◽  
Xue-Dong Wang ◽  
Guo-Qing Wei ◽  
Liang-Sheng Liao
Keyword(s):  
Optical Waveguide ◽  
Optical Waveguides ◽  
Rational Design ◽  
Logic Gate ◽  
Photonic Devices ◽  
Organic Crystals ◽  
Optical Logic ◽  
Personal View ◽  
One Dimensional ◽  
Optical Logic Gate

Abstract Optical waveguide of organic micro/nanocrystals is one of crucial elements in miniaturized integrated photonics. One-dimensional (1D) organic crystals with various optical features have attracted increasing interests towards promising photonic devices, such as multichannel signal converter, organic field-effect optical waveguide, sensitive detector, and optical logic gate. Therefore, a summary about the 1D organic micro/nanocrystals based optical waveguide is important for the rational design and fabrication of novel optical devices towards optoelectronics applications. Herein, recent advances of optical waveguide based on 1D organic micro/nanocrystals with solid, flexible, hollow, uniformly doped, core-shell, multiblock and branched structures are summarized from the aspects of the waveguide properties and applications in photonic devices. Furthermore, we presented our personal view about the expectation of future development in 1D organic optical waveguide for the photonic applications. Graphical abstract

Modeling Silicon-Based Periodic Waveguides for Optical Interconnects

2012 ◽  
Vol 1438 ◽  
Author(s):  
Meng-Mu Shih
Keyword(s):  
Optical Waveguides ◽  
Mode Coupling ◽  
Optical Interconnects ◽  
Hybrid Structure ◽  
Photonic Devices ◽  
Coupling Coefficients ◽  
Silicon Photonic ◽  
Metal Gratings ◽  
Silicon Based ◽  
Planar Optical Waveguides

ABSTRACTTo assist the precision and stability of wavelength at 1550 nm and 1300 nm in planar optical waveguides, hybrid semiconductor-metal corrugated gratings with nanometer period are integrated into silicon-based optical interconnects. This work utilizes multi-parametric optical waveguide models to compute the mode-coupling coefficients in the silicon photonic devices. For such a semiconductor-metal hybrid structure, a proper photonic technique needs to be utilized to solve this computational complexity. The optical method and the photonic method are used to compute coupling coefficients. Both methods have close numerical values shown in figures. Numerical results demonstrate how the normalized corrugation amplitudes of metal gratings can affect the coupling coefficients. Further physical interpretation and discussion can support and explain the above results. The modeling results can help engineers decide the values of parameters used in the design and fabrication of optical waveguides.

scholarly journals Double-layer graphene on photonic crystal waveguide electro-absorption modulator with 12 GHz bandwidth

Nanophotonics ◽  
2019 ◽  
Vol 9 (8) ◽  
pp. 2377-2385 ◽  
Author(s):  
Zhao Cheng ◽  
Xiaolong Zhu ◽  
Michael Galili ◽  
Lars Hagedorn Frandsen ◽  
Hao Hu ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Double Layer ◽  
Slow Light ◽  
Modulation Depth ◽  
Photonic Crystal Waveguide ◽  
Optical Modulators ◽  
Layer Graphene ◽  
Silicon Photonic ◽  
On Chip ◽  
Silicon Based

AbstractGraphene has been widely used in silicon-based optical modulators for its ultra-broadband light absorption and ultrafast optoelectronic response. By incorporating graphene and slow-light silicon photonic crystal waveguide (PhCW), here we propose and experimentally demonstrate a unique double-layer graphene electro-absorption modulator in telecommunication applications. The modulator exhibits a modulation depth of 0.5 dB/μm with a bandwidth of 13.6 GHz, while graphene coverage length is only 1.2 μm in simulations. We also fabricated the graphene modulator on silicon platform, and the device achieved a modulation bandwidth at 12 GHz. The proposed graphene-PhCW modulator may have potentials in the applications of on-chip interconnections.

scholarly journals Topology Design of Digital Metamaterials for Ultra-Compact Integrated Photonic Devices Based on Mode Manipulation

2021 ◽  
Author(s):  
Han Ye ◽  
Yanrong Wang ◽  
Shuhe Zhang ◽  
Danshi Wang ◽  
Yumin Liu ◽  
...  
Keyword(s):  
Photonic Devices ◽  
Topology Design ◽  
Functional Region ◽  
Optical Interconnections ◽  
Silicon Waveguide ◽  
All Optical ◽  
On Chip ◽  
Mode Order

Precise manipulation of mode order in silicon waveguide plays a fundamental role in the on-chip all-optical interconnections and is still a tough task in design when the functional region is...

CMOS compatible silicon-based Mach-Zehnder optical modulators with improved extinction ratio

2011 ◽  
Author(s):  
Zhiyong Li ◽  
Liang Zhou ◽  
Yingtao Hu ◽  
Xi Xiao ◽  
Yude Yu ◽  
...  
Keyword(s):  
Extinction Ratio ◽  
Optical Modulators ◽  
Cmos Compatible ◽  
Silicon Based

He+ Implanted Stripe Optical Waveguides in LiNbo3

1988 ◽  
Vol 126 ◽  
Author(s):  
B. L. Weiss ◽  
G. T. Reed
Keyword(s):  
Optical Waveguides ◽  
Fabrication Process ◽  
Propagation Losses ◽  
Te And Tm Modes

ABSTRACTIn this paper the fabrication process and characteristics of waveguides produced by He+ implantation in Y-cut X- and Z-propagating LiNbO3 are presented It is shown that low propagation losses, down to 1dB cm−1 at λ = 633μm can be obtained for TM modes only in Y-cut X-propagation samples whilst Y-cut Z propagating samples support both TE and TM modes with relatively low losses.

The Effect of Catalyst on Carbon Nanotubes (CNTs) Synthesized by Catalytic Chemical Vapor Deposition (CVD) Technique

2011 ◽  
Vol 364 ◽  
pp. 232-237 ◽  
Author(s):  
S.Y. Lim ◽  
M.M. Norani
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Dry Etching ◽  
Wet Etching ◽  
Etching Time ◽  
Catalytic Chemical Vapor Deposition ◽  
Catalyst Pretreatment ◽  
Diameter Range

Catalyst plays a crucial role in determining the characteristics of carbon nanotubes (CNTs) produced by using thermal catalytic chemical vapor deposition (CVD). It is essential to investigate how the catalyst preparation affects the characteristics of CNTs because certain application demands specific size for optimum performance. This study reports the effect of the types of catalyst and the duration of the catalyst pre-treatment (wet etching time, dry etching time and ball milling) on the diameter of CNTs. The synthesized CNTs samples were characterized by scanning and transmission electron microscopy and Raman spectroscopy. Wet etching (2M hydrofluoric acid) time was varied from 1 to 2.5 hrs and the diameter range was found to be in the range of 23 to 52 nm. The diameter range for CNTs produced for 3 hrs and 5 hrs of dry etching treatment (with ammonia gas) are 38 to 51 nm and 23 to 48 nm, respectively. The diameter size of CNTs produced using Ni (14 to 25 nm) was found to be smaller than Fe (38 to 51 nm). There is a significant decrease in the diameter of CNTs by prolonging the wet etching period. Shorter and curly shaped CNTs can also be obtained by using Ni as the catalyst. Keywords: chemical vapor deposition, carbon nanotubes, catalyst pretreatment

scholarly journals Fabrication of Porous Silicon Based Humidity Sensing Elements on Paper

2015 ◽  
Vol 2015 ◽  
pp. 1-10 ◽  
Author(s):  
Tero Jalkanen ◽  
Anni Määttänen ◽  
Ermei Mäkilä ◽  
Jaani Tuura ◽  
Martti Kaasalainen ◽  
...  
Keyword(s):  
Porous Silicon ◽  
Smart Cities ◽  
Low Cost ◽  
Electrical Characterization ◽  
Fabrication Process ◽  
Sensing Element ◽  
Paper Substrate ◽  
Roll To Roll ◽  
Silver Electrodes ◽  
Silicon Based

A roll-to-roll compatible fabrication process of porous silicon (pSi) based sensing elements for a real-time humidity monitoring is described. The sensing elements, consisting of printed interdigitated silver electrodes and a spray-coated pSi layer, were fabricated on a coated paper substrate by a two-step process. Capacitive and resistive responses of the sensing elements were examined under different concentrations of humidity. More than a three orders of magnitude reproducible decrease in resistance was measured when the relative humidity (RH) was increased from 0% to 90%. A relatively fast recovery without the need of any refreshing methods was observed with a change in RH. Humidity background signal and hysteresis arising from the paper substrate were dependent on the thickness of sensing pSi layer. Hysteresis in most optimal sensing element setup (a thick pSi layer) was still noticeable but not detrimental for the sensing. In addition to electrical characterization of sensing elements, thermal degradation and moisture adsorption properties of the paper substrate were examined in connection to the fabrication process of the silver electrodes and the moisture sensitivity of the paper. The results pave the way towards the development of low-cost humidity sensors which could be utilized, for example, in smart packaging applications or in smart cities to monitor the environment.

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