Directly induced ablation of metal thin films by ultrashort laser pulses

2011 ◽  
Author(s):  
Gerhard Heise ◽  
Jan Konrad ◽  
Sebastian Sarrach ◽  
Jürgen Sotrop ◽  
Heinz P. Huber
Keyword(s):  
Thin Films ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
Metal Thin Films ◽  
Ultrashort Laser

scholarly journals Influence of pulse duration on the amorphization of GeSb thin films under ultrashort laser pulses

2004 ◽  
Vol 84 (22) ◽  
pp. 4445-4447 ◽  
Author(s):  
S. M. Wiggins ◽  
J. Solis ◽  
C. N. Afonso
Keyword(s):  
Thin Films ◽  
Pulse Duration ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
Ultrashort Laser

Ablation of aluminum thin films by ultrashort laser pulses

2001 ◽  
Vol 89 (12) ◽  
pp. 8247-8252 ◽  
Author(s):  
B. Le Drogoff ◽  
F. Vidal ◽  
Y. von Kaenel ◽  
M. Chaker ◽  
T. W. Johnston ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
Ultrashort Laser

Time-resolved study of back side ablated molybdenum thin films by ultrashort laser pulses

2012 ◽  
Vol 110 (1) ◽  
pp. 227-233 ◽  
Author(s):  
Dominik Bartl ◽  
Andreas Michalowski ◽  
Margit Hafner ◽  
Andreas Letsch ◽  
Stefan Nolte ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
Back Side ◽  
Time Resolved ◽  
Ultrashort Laser

scholarly journals Femtosecond Laser Assisted Crystallization of Gold Thin Films

Nanomaterials ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 1186
Author(s):  
Ayesha Sharif ◽  
Nazar Farid ◽  
Rajani K. Vijayaraghavan ◽  
Patrick J. McNally ◽  
Gerard M. O’Connor
Keyword(s):  
Thin Films ◽  
Femtosecond Laser ◽  
Quartz Substrate ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Industrial Applications ◽  
Ultrashort Laser Pulses ◽  
Gold Films ◽  
Gold Thin Films ◽  
Ultrashort Laser

We propose a novel low temperature annealing method for selective crystallization of gold thin films. Our method is based on a non-melt process using highly overlapped ultrashort laser pulses at a fluence below the damage threshold. Three different wavelengths of a femtosecond laser with the fundamental (1030 nm), second (515 nm) and third (343 nm) harmonic are used to crystallize 18-nm and 39-nm thick room temperature deposited gold thin films on a quartz substrate. Comparison of laser wavelengths confirms that improvements in electrical conductivity up to 40% are achievable for 18-nm gold film when treated with the 515-nm laser, and the 343-nm laser was found to be more effective in crystallizing 39-nm gold films with 29% improvement in the crystallinity. A two-temperature model provides an insight into ultrashort laser interactions with gold thin films and predicts that applied fluence was insufficient to cause melting of gold films. The simulation results suggest that non-equilibrium energy transfer between electrons and lattice leads to a solid-state and melt-free crystallization process. The proposed low fluence femtosecond laser processing method offers a possible solution for a melt-free thin film crystallization for wide industrial applications.

Selective ablation of thin films with short and ultrashort laser pulses

2006 ◽  
Vol 252 (13) ◽  
pp. 4814-4818 ◽  
Author(s):  
J. Hermann ◽  
M. Benfarah ◽  
G. Coustillier ◽  
S. Bruneau ◽  
E. Axente ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
Selective Ablation ◽  
Ultrashort Laser

Encryption of nonlinear optical signals in ZnO:Al thin films by ultrashort laser pulses

2016 ◽  
Vol 64 (6) ◽  
pp. 601-608 ◽  
Author(s):  
J. H. Castro-Chacón ◽  
C. Torres-Torres ◽  
A. V. Khomenko ◽  
M. A. García-Zárate ◽  
M. Trejo-Valdez ◽  
...  
Keyword(s):  
Thin Films ◽  
Nonlinear Optical ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
Optical Signals ◽  
Ultrashort Laser

scholarly journals Lift-Off Ablation of Metal Thin Films for Micropatterning Using Ultrashort Laser Pulses

Metals ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1586
Author(s):  
Byunggi Kim ◽  
Han-Ku Nam ◽  
Young-Jin Kim ◽  
Seung-Woo Kim
Keyword(s):  
Thin Films ◽  
Ultrashort Pulses ◽  
Single Pulse ◽  
Laser Pulses ◽  
Mean Free Path ◽  
Ultrashort Laser Pulses ◽  
Strong Electron ◽  
Metal Thin Films ◽  
Thin Film Layer ◽  
Lift Off

Laser ablation of metal thin films draws attention as a fast means of clean micropatterning. In this study, we attempt to remove only the metal thin film layer selectively without leaving thermal damage on the underneath substrate. Specifically, our single-pulse ablation experiment followed by two-temperature analysis explains that selective ablation can be achieved for gold (Au) films of 50–100 nm thickness by the lift-off process induced as a result of vaporization of the titanium (Ti) interlayer with a strong electron–phonon coupling. With increasing the film thickness comparable to the mean free path of electrons (100 nm), the pulse duration has to be taken shorter than 10 ps, as high-temperature electrons generated by the ultrashort pulses transfer heat to the Ti interlayer. We verify the lift-off ablation by implementing millimeters-scale micropatterning of optoelectronic devices without degradation of optical properties.

scholarly journals Selective Ablation of Thin Films by Ultrashort Laser Pulses

2012 ◽  
Vol 39 ◽  
pp. 594-602 ◽  
Author(s):  
Shizhou Xiao ◽  
Benjamin Schöps ◽  
Andreas Ostendorf
Keyword(s):  
Thin Films ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
Selective Ablation ◽  
Ultrashort Laser
Sign in / Sign up

Export Citation Format

Share Document