ABSTRACTThin-film silicon solar cells have been attracted a lot of intention as low-cost solar cells. One of the most important technologies for improving their performances is light trapping. We have demonstrated the high potential of double-textured zinc oxide (ZnO) thin films used as front transparent conductive oxide (TCO) films due to further enhancement of their light-trapping effects. Although the laser scribing method has already been well established for low-cost thin-film silicon solar cell module manufacturing, laser scribing technique on double-textured ZnO is new and still a challenging issue. In this study, we firstly demonstrated the availability of laser scribing for amorphous silicon (a-Si) solar cells fabricated on double-textured ZnO substrates. It is general to utilize lasers with wavelength of 1.06 μm and 532 nm for scribing of TCO and silicon layer, respectively. Here we attempted to scribe both of TCO and silicon layers using a 532 nm wavelength laser (green laser) for process simplifying.
Depth selective laser scribing of thin-film silicon solar cells on foil