High power all-fiber picosecond laser system for UV light generation

2012 ◽  
Author(s):  
M. Oku ◽  
K. Kieu ◽  
N. Peyghambarian
Laser Physics ◽  
2013 ◽  
Vol 23 (7) ◽  
pp. 075114 ◽  
Author(s):  
Yi-Jing You ◽  
Chih-Hsuan Lin ◽  
Alexey Zaytsev ◽  
Feng-Hua Tsai ◽  
Chi-Luen Wang ◽  
...  

1986 ◽  
Vol 16 (12) ◽  
pp. 1582-1585 ◽  
Author(s):  
A Varanavichyus ◽  
R Grigonis ◽  
R Danelyus ◽  
A Piskarskas ◽  
D Podenas

2020 ◽  
Vol 10 (19) ◽  
pp. 6891
Author(s):  
Shuaishuai Yang ◽  
Zijian Cui ◽  
Ziming Sun ◽  
Pan Zhang ◽  
Dean Liu

Compact, stable, high-power and high repetition rate picosecond laser systems are excellent sources for optical parametric chirped pulse amplification systems and laser satellite ranging systems. Compared with the traditional complex high-power amplifier, this article reports a compact high-power picosecond laser system at a repetition rate of 1 kHz based on Nd:YAG bulk crystal. The thermal lens effect limits the regenerative amplifier to directly output higher energy. For this reason, multi-stage traveling-wave amplifiers are usually used to gradually increase the laser pulse energy. So as to achieve a compact structure, a regenerative amplifier that can output higher power at 1 kHz is designed in the laser system. The regenerative amplifier can output the power of 6.5 W at the pump power of 41.5 W; the beam quality of M2 factor was about 1.3. A more flexible thermal depolarization compensation structure is applied in the side-pumped amplifier, which can effectively compensate for thermal lens effect and thermal depolarization at different pump powers. Finally, the laser pulse can achieve an output power higher than 50 W at 1 kHz after passing through an end-pumped traveling-wave amplifier and a side-pumped traveling wave amplifier.


2011 ◽  
Author(s):  
Robert Van Leeuwen ◽  
Yihan Xiong ◽  
Laurence S. Watkins ◽  
Jean-Francois Seurin ◽  
Guoyang Xu ◽  
...  

1988 ◽  
Vol 59 (10) ◽  
pp. 2235-2240 ◽  
Author(s):  
W. Tighe ◽  
C. H. Nam ◽  
J. Robinson ◽  
S. Suckewer

CPEM 2010 ◽  
2010 ◽  
Author(s):  
K. S. Lee ◽  
S. E. Park ◽  
T. Y. Kwon ◽  
S. B. Lee ◽  
J. Kim
Keyword(s):  

2018 ◽  
Vol 7 (1-2) ◽  
pp. 23-31 ◽  
Author(s):  
Hao Liu ◽  
Lars Jensen ◽  
Ping Ma ◽  
Detlev Ristau

AbstractAtomic layer deposition (ALD) facilitates the deposition of coatings with precise thickness, high surface conformity, structural uniformity, and nodular-free structure, which are properties desired in high-power laser coatings. ALD was studied to produce uniform and stable Al2O3and HfO2single layers and was employed to produce anti-reflection coatings for the harmonics (1ω, 2ω, 3ω, and 4ω) of the Nd:YAG laser. In order to qualify the ALD films for high-power laser applications, the band gap energy, absorption, and element content of single layers were characterized. The damage tests of anti-reflection coatings were carried out with a laser system operated at 1ω, 2ω, 3ω, and 4ω, respectively. The damage mechanism was discussed by analyzing the damage morphology and electric field intensity difference. ALD coatings exhibit stable growth rates, low absorption, and rather high laser-induced damage threshold (LIDT). The LIDT is limited by HfO2as the employed high-index material. These properties indicate the high versatility of ALD films for applications in high-power coatings.


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