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High Temperature Post Exposure Bake (HTPEB) For AZ® 4000 Photoresist
Mapping Intimacies
◽
10.1117/12.947846
◽
1985
◽
Cited By ~ 1
Author(s):
M. A. Spak
Keyword(s):
High Temperature
◽
Post Exposure
◽
Post Exposure Bake
Download Full-text
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Cited By
References
High‐Temperature‐Post‐Exposure Bake Process (HIT‐PEB) for Base‐Developable Polyimides Consisting of Diazonaphthoquinones and Polyamic Acids
Journal of The Electrochemical Society
◽
10.1149/1.2085469
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1991
◽
Vol 138
(12)
◽
pp. 3625-3629
◽
Cited By ~ 24
Author(s):
Shuzi Hayase
◽
Kei Takano
◽
Yukihiro Mikogami
◽
Yoshihiko Nakano
Keyword(s):
High Temperature
◽
Post Exposure
◽
Post Exposure Bake
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A novel post exposure bake technique to improve CD uniformity over product wafers
10.1117/12.599192
◽
2005
◽
Cited By ~ 1
Author(s):
Tomoyuki Takeishi
◽
K. Hayasaki
◽
Tsuyoshi Shibata
Keyword(s):
Post Exposure
◽
Post Exposure Bake
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Effect and procedures of post-exposure bake temperature optimization on the CD uniformity in a mass production environment
10.1117/12.712145
◽
2007
◽
Cited By ~ 5
Author(s):
Kirsten Ruck
◽
Heiko Weichert
◽
Steffen Hornig
◽
Frank Finger
◽
Göran Fleischer
◽
...
Keyword(s):
Mass Production
◽
Production Environment
◽
Post Exposure
◽
Temperature Optimization
◽
Post Exposure Bake
Download Full-text
Calibration of A Low-Temperature Cable-Less Lightpipe Pyrometer on The NIST Post-Exposure Bake Test Bed
2005 13th International Conference on Advanced Thermal Processing of Semiconductors
◽
10.1109/rtp.2005.1613709
◽
2006
◽
Author(s):
B.K. Tsai
◽
K.G. Kreider
◽
W.A. Kimes
Keyword(s):
Low Temperature
◽
Test Bed
◽
Post Exposure
◽
Post Exposure Bake
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Sub-millisecond post exposure bake of chemically amplified resists by CO 2 laser heat treatment
10.1117/12.848418
◽
2010
◽
Cited By ~ 9
Author(s):
Byungki Jung
◽
Jing Sha
◽
Florencia Paredes
◽
Christopher K. Ober
◽
Michael O. Thompson
◽
...
Keyword(s):
Heat Treatment
◽
Laser Heat Treatment
◽
Post Exposure
◽
Chemically Amplified
◽
Laser Heat
◽
Post Exposure Bake
◽
Chemically Amplified Resists
Download Full-text
Effect of Post Exposure Bake in Inorganic Electron Beam Resist and Utilizing for Nanoimprint Mold
Journal of Nanoscience and Nanotechnology
◽
10.1166/jnn.2009.j040
◽
2009
◽
Vol 9
(1)
◽
pp. 562-566
◽
Cited By ~ 5
Author(s):
Miyako Shizuno
◽
Jun Taniguchi
◽
Kenta Ogino
◽
Kiyoshi Ishikawa
Keyword(s):
Electron Beam
◽
Post Exposure
◽
Post Exposure Bake
Download Full-text
Examination Of The Mechanism Of The Post Exposure Bake Effect
10.1117/12.968320
◽
1988
◽
Cited By ~ 1
Author(s):
P. Trefonas III
◽
B. K. Daniels
◽
M. J. Eller
◽
A. Zampini
Keyword(s):
Post Exposure
◽
Post Exposure Bake
Download Full-text
Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference
◽
10.1109/imnc.1999.797492
◽
2003
◽
Author(s):
Eun-Mi Lee
◽
Moon-Gyu Sung
◽
Young-Mi Lee
◽
Young-Soo Sohn
◽
Hye-Keun Oh
Keyword(s):
Post Exposure
◽
Chemically Amplified
◽
Chemically Amplified Resist
◽
Post Exposure Bake
◽
193 Nm
Download Full-text
Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists
10.1117/12.436826
◽
2001
◽
Cited By ~ 13
Author(s):
Mark D. Smith
◽
Chris A. Mack
◽
John S. Petersen
Keyword(s):
Thermal History
◽
Post Exposure
◽
Chemically Amplified
◽
Post Exposure Bake
◽
Chemically Amplified Resists
◽
The Impact
Download Full-text
Reduction Of Proximity Reflective Notching On A Double Metal Vlsi Process By High Temperature Post Exposure Baked
10.1117/12.963645
◽
1986
◽
Author(s):
John L. Nistler
◽
Tom R. Mead
◽
Mark A. Spak
Keyword(s):
High Temperature
◽
Post Exposure
Download Full-text
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