2005 13th International Conference on Advanced Thermal Processing of Semiconductors
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61

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5

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Published By IEEE

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Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Advanced Thermal Processing of Semiconductor Materials in the MSEC-Range

2005 13th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2005.1613684 ◽

2006 ◽

Author(s):

W. Skorupa ◽

R.A. Yankov ◽

M. Voelskow ◽

W. Anwand ◽

D. Panknin ◽

...

Keyword(s):

Thermal Processing ◽

Semiconductor Materials

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Superior Spike Annealing Performance in 65nm Source/Drain Extension Engineering

2005 13th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2005.1614331 ◽

2006 ◽

Author(s):

C.I. Li ◽

Chin Cheng Chien ◽

K.T. Huang ◽

Po Yuan Chen ◽

Hsiang Ying Wang ◽

...

Keyword(s):

Spike Annealing

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Calibration of A Low-Temperature Cable-Less Lightpipe Pyrometer on The NIST Post-Exposure Bake Test Bed

2005 13th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2005.1613709 ◽

2006 ◽

Author(s):

B.K. Tsai ◽

K.G. Kreider ◽

W.A. Kimes

Keyword(s):

Low Temperature ◽

Test Bed ◽

Post Exposure ◽

Post Exposure Bake

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Infrared Emittance Measurements at NIST

2005 13th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2005.1613711 ◽

2006 ◽

Author(s):

L.M. Hanssen ◽

B.K. Tsai ◽

S.N. Mekhontsev

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Suppression of Thermal Interface Degradation in High-K Film/SI by Helium

2005 13th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2005.1613682 ◽

2006 ◽

Author(s):

K. Muraoka

Keyword(s):

Thermal Interface ◽

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The FDTD Computation of Electromagnetic Wave Scattering from Wafer Surfaces

2005 13th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2005.1613718 ◽

2006 ◽

Author(s):

Kang Fu ◽

Pei-feng Hsu

Keyword(s):

Electromagnetic Wave ◽

Wave Scattering ◽

Electromagnetic Wave Scattering ◽

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Ni>inf<2>/inf<Si and NiSi Formation by Low Temperature Soak and Spike RTPs

2005 13th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2005.1613706 ◽

2006 ◽

Author(s):

Eun-Ha Kim ◽

H. Forstner ◽

M. Foad ◽

N. Tam ◽

S. Ramamurthy ◽

...

Keyword(s):

Low Temperature

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Near-Ideal Implanted Shallow-Junction Diode Formation by Excimer Laser Annealing

2005 13th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2005.1613688 ◽

2006 ◽

Author(s):

V. Gonda ◽

A. Burtsev ◽

T.L.M. Scholtes ◽

L.K. Nanver

Keyword(s):

Excimer Laser ◽

Laser Annealing ◽

Excimer Laser Annealing ◽

Shallow Junction ◽

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Synthesis and Control of Ultra Thin Gate Oxides for the 90 and 65 NM Nodes

2005 13th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2005.1614325 ◽

2006 ◽

Author(s):

J.F. Shepard ◽

A. Chou ◽

M. Chudzik ◽

C. Collins ◽

M. Freiler ◽

...

Keyword(s):

Gate Oxides ◽

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Multiple Reflection Effects During The In-SITU Calibration of an Emissivity Independent Radiation Thermometer

2005 13th International Conference on Advanced Thermal Processing of Semiconductors ◽

10.1109/rtp.2005.1613710 ◽

2006 ◽

Author(s):

B.J. Brosilow ◽

Y. Naor ◽

Y. Baharav

Keyword(s):

Radiation Thermometer ◽

Multiple Reflection ◽

In Situ Calibration

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