Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists
Keyword(s):
Submillisecond post-exposure bake of chemically amplified resists by CO[sub 2] laser spike annealing
2009 ◽
Vol 27
(6)
◽
pp. 3020
◽
Keyword(s):
1998 ◽
pp. 345-357
◽
Keyword(s):
Keyword(s):
2011 ◽
Vol 24
(5)
◽
pp. 487-490
◽
1997 ◽
Vol 36
(Part 1, No. 12B)
◽
pp. 7611-7614
◽
Keyword(s):
1992 ◽
Vol 32
(21)
◽
pp. 1565-1570
◽