Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay

2003 ◽  
Author(s):  
Eun-Mi Lee ◽  
Moon-Gyu Sung ◽  
Young-Mi Lee ◽  
Young-Soo Sohn ◽  
Hye-Keun Oh
Keyword(s):  
Post Exposure ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Post Exposure Bake ◽  
193 Nm

Characterization of 193 nm Chemically Amplified Resist during Post Exposure Bake and Post Exposure Delay

1999 ◽  
Vol 38 (Part 1, No. 12B) ◽  
pp. 7094-7098 ◽  
Author(s):  
Eun-Mi Lee ◽  
Moon-Gyu Sung ◽  
Young-Mi Lee ◽  
Young-Soo Sohn ◽  
Hye-Keun Oh
Keyword(s):  
Post Exposure ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Post Exposure Bake ◽  
193 Nm

scholarly journals Time Dependent Behavior of Chemically Amplified Resist Characterized under Sub-millisecond Post Exposure Bake

2011 ◽  
Vol 24 (5) ◽  
pp. 487-490 ◽  
Author(s):  
Byungki Jung ◽  
Manish Chandhok ◽  
Todd R. Younkin ◽  
Christopher K. Ober ◽  
Michael O. Thompson
Keyword(s):  
Time Dependent ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Dependent Behavior ◽  
Chemically Amplified Resist ◽  
Post Exposure Bake

Post-Exposure-Bake Simulation Model with Constant Acid Loss of Chemically Amplified Resist

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7611-7614 ◽  
Author(s):  
Yuichiro Yanagishita ◽  
Shuichi Miyata ◽  
Yuko Kaimoto ◽  
Akira Oikawa ◽  
Ei Yano ◽  
...  
Keyword(s):  
Simulation Model ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Post Exposure Bake

Sub-millisecond post exposure bake of chemically amplified resists by CO 2 laser heat treatment

2010 ◽  
Author(s):  
Byungki Jung ◽  
Jing Sha ◽  
Florencia Paredes ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Laser Heat Treatment ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Laser Heat ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

Modification of development parameters of 193-nm chemically amplified resist with pattern density

2001 ◽  
Author(s):  
Eun-Jung Seo ◽  
Young-Soo Sohn ◽  
Heungin Bak ◽  
Hye-Keun Oh ◽  
Sang-Gyun Woo ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Pattern Density ◽  
Chemically Amplified Resist ◽  
193 Nm
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