Wave Aberration Function

Author(s):  
Julie Bentley ◽  
Craig Olson
Keyword(s):  
Author(s):  
Hannes Lichte

Generally, the electron object wave o(r) is modulated both in amplitude and phase. In the image plane of an ideal imaging system we would expect to find an image wave b(r) that is modulated in exactly the same way, i. e. b(r) =o(r). If, however, there are aberrations, the image wave instead reads as b(r) =o(r) * FT(WTF) i. e. the convolution of the object wave with the Fourier transform of the wave transfer function WTF . Taking into account chromatic aberration, illumination divergence and the wave aberration of the objective lens, one finds WTF(R) = Echrom(R)Ediv(R).exp(iX(R)) . The envelope functions Echrom(R) and Ediv(R) damp the image wave, whereas the effect of the wave aberration X(R) is to disorder amplitude and phase according to real and imaginary part of exp(iX(R)) , as is schematically sketched in fig. 1.Since in ordinary electron microscopy only the amplitude of the image wave can be recorded by the intensity of the image, the wave aberration has to be chosen such that the object component of interest (phase or amplitude) is directed into the image amplitude. Using an aberration free objective lens, for X=0 one sees the object amplitude, for X= π/2 (“Zernike phase contrast”) the object phase. For a real objective lens, however, the wave aberration is given by X(R) = 2π (.25 Csλ3R4 + 0.5ΔzλR2), Cs meaning the coefficient of spherical aberration and Δz defocusing. Consequently, the transfer functions sin X(R) and cos(X(R)) strongly depend on R such that amplitude and phase of the image wave represent only fragments of the object which, fortunately, supplement each other. However, recording only the amplitude gives rise to the fundamental problems, restricting resolution and interpretability of ordinary electron images:


2016 ◽  
Vol 370 ◽  
pp. 68-74 ◽  
Author(s):  
Xin Gao ◽  
Xinzhu Sang ◽  
Xunbo Yu ◽  
Duo Chen ◽  
Zhidong Chen ◽  
...  

Author(s):  
L.N. Timashova ◽  
N.N. Kulakova

The control of the shape of the optical part surface by the interference method has become an integral part of the process of their shaping. With a precisely focused interferometer interferometry allows obtaining an interference pattern similar to a topographic map of the error profile of the wave surface under investigation. The interferometer must form a map of the optical surface with high accuracy --- the permissible distortion of the interference fringe caused by an interferometer error should not exceed 0.1 of the distortion value caused by an error on the examined surface. The dependence of the interference pattern formation on the errors in the arrangement of the interferometer components, i.e., defocusing, was theoretically analyzed using Fourier transforms. The analysis was performed for an interferometer containing a laser illuminator, a concave spherical mirror with a central hole, coaxial to the illuminator, and a beamsplitting element in the form of a cube-prism with a semitransparent hypotenuse face. On the first flat face of the cube-prism, a microspherical concave mirror is made with the center located on the optical axis of the interferometer. A method for calculating the defocusing of a controlled spherical mirror and the corresponding wave aberration of the working wavefront is presented. An example of calculating the design parameters of the interferometer and the permissible defocusing of the controlled spherical mirror is given


2018 ◽  
Vol 41 ◽  
pp. S50 ◽  
Author(s):  
Mauro Frisani ◽  
Michela Greco ◽  
Marina Serio
Keyword(s):  

2004 ◽  
Vol 115 (6) ◽  
pp. 2998-3009 ◽  
Author(s):  
Svein-Erik Måsøy ◽  
Bjørn Angelsen ◽  
Trond Varslot

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