Low-Power RF plasma sources for technological applications: III. helicon plasma sources

Technical Physics ◽

10.1134/1.1767876 ◽

2004 ◽

Vol 49 (6) ◽

pp. 691-697 ◽

Author(s):

K. V. Vavilin ◽

A. A. Rukhadze ◽

Kh. M. Ri ◽

V. Yu. Plaksin

Keyword(s):

Low Power ◽

Rf Plasma ◽

Helicon Plasma ◽

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Low-power inductive RF plasma sources for technological applications

Plasma Physics Reports ◽

10.1134/1.1788762 ◽

2004 ◽

Vol 30 (8) ◽

pp. 687-697 ◽

Author(s):

K. V. Vavilin ◽

A. A. Rukhadze ◽

M. Kh. Ri ◽

V. Yu. Plaksin

Keyword(s):

Low Power ◽

Rf Plasma ◽

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Low-power rf plasma sources for technological applications: I. Plasma sources without a magnetic field

Technical Physics ◽

10.1134/1.1758329 ◽

2004 ◽

Vol 49 (5) ◽

pp. 565-571 ◽

Author(s):

K. V. Vavilin ◽

A. A. Rukhadze ◽

M. Kh. Ri ◽

V. Yu. Plaksin

Keyword(s):

Magnetic Field ◽

Low Power ◽

Rf Plasma ◽

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Low-power RF plasma sources for technological applications: II. plasma sources under anomalous skin effect conditions

Technical Physics ◽

10.1134/1.1767875 ◽

2004 ◽

Vol 49 (6) ◽

pp. 686-690 ◽

Author(s):

K. V. Vavilin ◽

V. Yu. Plaksin ◽

Kh. M. Ri ◽

A. A. Rukhadze

Keyword(s):

Low Power ◽

Skin Effect ◽

Rf Plasma ◽

Plasma Sources ◽

Anomalous Skin Effect

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Modeling of profile effects for inductive helicon plasma sources

IEEE Transactions on Plasma Science ◽

10.1109/27.491753 ◽

1996 ◽

Vol 24 (1) ◽

pp. 152-160 ◽

Author(s):

Y. Mouzouris ◽

J.E. Scharer

Keyword(s):

Helicon Plasma ◽

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High temperature electrons exhausted from rf plasma sources along a magnetic nozzle

Physics of Plasmas ◽

10.1063/1.4990110 ◽

2017 ◽

Vol 24 (8) ◽

pp. 084503 ◽

Author(s):

Kazunori Takahashi ◽

Hikaru Akahoshi ◽

Christine Charles ◽

Rod W. Boswell ◽

Akira Ando

Keyword(s):

High Temperature ◽

Rf Plasma ◽

Plasma Sources ◽

Magnetic Nozzle

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Characterization of developed high-density helicon plasma sources and Helicon Electrodeless Advanced Thruster (HEAT) project

2013 Abstracts IEEE International Conference on Plasma Science (ICOPS) ◽

10.1109/plasma.2013.6634870 ◽

2013 ◽

Author(s):

S. Shinohara ◽

H. Nishida ◽

T. Tanikawa ◽

T. Hada ◽

I. Funaki ◽

...

Keyword(s):

High Density ◽

Helicon Plasma ◽

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The Effect of Key Parameters on Power Absorption in Helicon Plasma Sources

IEEE Transactions on Plasma Science ◽

10.1109/tps.2020.3003090 ◽

2020 ◽

Vol 48 (7) ◽

pp. 2337-2350

Author(s):

S. Fazelpour ◽

H. Sadeghi ◽

A. Chakhmachi ◽

D. Iraji ◽

M. Omrani ◽

...

Keyword(s):

Power Absorption ◽

Helicon Plasma ◽

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Noncollisional heating and electron energy distributions in magnetically enhanced inductively coupled and helicon plasma sources

Journal of Applied Physics ◽

10.1063/1.1400091 ◽

2001 ◽

Vol 90 (8) ◽

pp. 3699-3712 ◽

Author(s):

Ronald L. Kinder ◽

Mark J. Kushner

Keyword(s):

Electron Energy ◽

Energy Distributions ◽

Helicon Plasma ◽

Plasma Sources ◽

Inductively Coupled

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Unintentional boron incorporation in AlGaN layers grown by plasma-assisted MBE using highly efficient nitrogen RF plasma-sources

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2017.01.007 ◽

2017 ◽

Vol 477 ◽

pp. 154-158 ◽

Author(s):

S.V. Novikov ◽

C.T. Foxon

Keyword(s):

Rf Plasma ◽

Plasma Sources ◽

Highly Efficient

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Mini-conference on helicon plasma sources

Physics of Plasmas ◽

10.1063/1.2844795 ◽

2008 ◽

Vol 15 (5) ◽

pp. 058301 ◽

Author(s):

E. E. Scime ◽

A. M. Keesee ◽

R. W. Boswell

Keyword(s):

Helicon Plasma ◽

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