scholarly journals Adhesion energy in the metal/oxide system for the case of high-temperature oxidation of nickel-based superalloys

2017 ◽  
Vol 2017 (10) ◽  
pp. 884-889
Author(s):  
V. V. Moskvichev ◽  
N. V. Sukhodoeva ◽  
E. N. Fedorova ◽  
A. S. Popov
1993 ◽  
Vol 322 ◽  
Author(s):  
C. E. Ramberg ◽  
P. Beatrice ◽  
K. Kurokawa ◽  
W. L. Worrell

AbstractThe factors which control the formation of a protective silica (SiO2) layer on structural silicides at high temperature are summarized. The thermodynamic and kinetic conditions under which both silica and a metal oxide can form are also described. Molybdenum disilicide (MoSi2) forms highly protective silica scales and has the best oxidation resistance at high temperatures. Although the preparation method has little influence, the heating rate and the structure of the silica layer have significant effects on the oxidation behavior of MoSi2.


2001 ◽  
Vol 7 (S2) ◽  
pp. 1214-1215 ◽  
Author(s):  
C.E. Kliewer ◽  
J. Varon ◽  
A. Malek ◽  
G.J. DeMartin

Transmission electron microscopy (TEM) has traditionally served as an important tool for understanding the physical properties of many materials. Recent improvements in “ex-situ” techniques have further strengthened the role of TEM as a unique characterization method.The use of ExxonMobilfs dedicated reactor system for studying metal oxidation at moderate temperatures has been reported. However, high temperature oxidation studies have been limited by the use of holey carbon support films, which oxidize and disintegrate during these experiments. Consequently, a new method was developed to replace the holey carbon support film with a holey metal oxide support film that both maintains its structural integrity during high temperature oxidation and remains electron transparent.The new support film was prepared using a commercially available, holey carbon coated TEM grid as a template (Figure 1). An Al metal film (∼10nm thick) was deposited onto the holey carbon coated side of the TEM grid using a magnetron sputtering system.


2009 ◽  
Vol 51 (3) ◽  
pp. 539-546 ◽  
Author(s):  
H. Svensson ◽  
M. Christensen ◽  
P. Knutsson ◽  
G. Wahnström ◽  
K. Stiller

2011 ◽  
Vol 28 (4) ◽  
pp. 274-278 ◽  
Author(s):  
Jérôme Issartel ◽  
Sébastien Martoia ◽  
Frédéric Charlot ◽  
Valérie Parry ◽  
Yves Wouters ◽  
...  

2003 ◽  
Vol 100 (1) ◽  
pp. 73-82
Author(s):  
Y. Riquier ◽  
D. Lassance ◽  
I. Li ◽  
J. M. Detry ◽  
A. Hildenbrand

2013 ◽  
Vol 51 (10) ◽  
pp. 743-751 ◽  
Author(s):  
Seon-Hui Lim ◽  
Jae-Sung Oh ◽  
Young-Min Kong ◽  
Byung-Kee Kim ◽  
Man-Ho Park ◽  
...  

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