Field Emission Properties of Surface-Modified Silicon Crystals of Different Types of Conduction

2019 ◽  
Vol 64 (3) ◽  
pp. 265-270
Author(s):  
R. K. Yafarov ◽  
S. Yu. Suzdal’tsev ◽  
V. Ya. Shanygin
2019 ◽  
Vol 89 (6) ◽  
pp. 952
Author(s):  
Р.К. Яфаров

AbstractVariations of the morphology and field-emission properties of surface-structured n - and p -type silicon wafers have been studied. The silicon surface has been structured by etching in a fluorine–carbon plasma and depositing subnanodimensional island carbon masks. It has been shown that surface structuring in a fluorine–carbon plasma makes it possible to reach desired field-emission currents in electric fields of different strengths. Physicochemical models of field emission mechanisms and models of destruction of surface-modified multipoint silicon array cathodes have been considered.


2017 ◽  
Vol 123 (2) ◽  
Author(s):  
Vivekanand S. Bagal ◽  
Girish P. Patil ◽  
Amol B. Deore ◽  
Prashant K. Baviskar ◽  
Dhammanand J. Shirale ◽  
...  

2013 ◽  
Vol 9 (5) ◽  
pp. 619-623 ◽  
Author(s):  
Shama Parveen ◽  
Samina Husain ◽  
Avshish Kumar ◽  
Javid Ali ◽  
Mubashshir Husain ◽  
...  

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