Туннельная эмиссия электронов из наноструктурированных кремниевых катодных матриц с фтор-углеродным покрытием
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P Type
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AbstractVariations of the morphology and field-emission properties of surface-structured n - and p -type silicon wafers have been studied. The silicon surface has been structured by etching in a fluorine–carbon plasma and depositing subnanodimensional island carbon masks. It has been shown that surface structuring in a fluorine–carbon plasma makes it possible to reach desired field-emission currents in electric fields of different strengths. Physicochemical models of field emission mechanisms and models of destruction of surface-modified multipoint silicon array cathodes have been considered.
2017 ◽
Vol 423
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pp. 788-792
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2016 ◽
Vol 34
(2)
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pp. 02G107
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2019 ◽
Vol 64
(3)
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pp. 265-270
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