A pulsed method for thermal-diffusivity measurements of polymer films with submicrometre thickness

1986 ◽  
Vol 64 (9) ◽  
pp. 1200-1203 ◽  
Author(s):  
H. Coufal ◽  
P. Hefferle
Keyword(s):  
Thin Films ◽  
Thermal Diffusivity ◽  
Laser Pulse ◽  
Heat Source ◽  
Polymer Films ◽  
Heat Pulse ◽  
Diffusivity Measurements ◽  
Pulsed Measurements

The use of pyroelectric calorimeters for pulsed measurements of the thermal diffusivity of thin films is described. The material under study is directly coated on to a pyroelectric calorimeter. A transient heat source is generated at the surface of the sample via absorption of a laser pulse. By analysis of the transmitted heat pulse, the thermal diffusivity of the sample can be determined. The potentials of this method are demonstrated on polymer films with thicknesses in the submicrometre range.

Thermal diffusivity measurements of semiconducting amorphous Ge Se100− thin films by photothermal deflection technique

2004 ◽  
Vol 227 (1-4) ◽  
pp. 410-415 ◽  
Author(s):  
Alex Mathew ◽  
Jyotsna Ravi ◽  
K.N. Madhusoodanan ◽  
K.P.R. Nair ◽  
T.M.A. Rasheed
Keyword(s):  
Thin Films ◽  
Thermal Diffusivity ◽  
Diffusivity Measurements ◽  
Photothermal Deflection

Heat conduction in silicon thin films: Effect of microstructure

1995 ◽  
Vol 10 (8) ◽  
pp. 1889-1896 ◽  
Author(s):  
Lanhua Wei ◽  
Mark Vaudin ◽  
Cheol Song Hwang ◽  
Grady White ◽  
Jason Xu ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Properties ◽  
Thermal Diffusivity ◽  
Chemical Vapor ◽  
Bulk Silicon ◽  
Amorphous Films ◽  
Silicon Thin Films ◽  
Diffusivity Measurements ◽  
Pressure Chemical ◽  
Wave Technique

A study was made of the thermal properties of low pressure chemical vapor deposition (LPCVD) silicon thin films with amorphous and polycrystalline microstructures, produced by varying the substrate temperature. Thermal diffusivity measurements were conducted using a thermal wave technique. The thermal diffusivity of the polycrystalline films was found to be about three times that of the amorphous films, but about one eighth that of bulk silicon single crystals. There was also an indication that the diffusivity increased with deposition temperature above the transition temperature from the amorphous to the polycrystalline state. The relationships between the thermal properties and microstructural features, such as grain size and grain boundary, are discussed.

Low thermal diffusivity measurements of thin films using mirage technique

1998 ◽  
Vol 84 (12) ◽  
pp. 6623-6627 ◽  
Author(s):  
P. K. Wong ◽  
P. C. W. Fung ◽  
H. L. Tam
Keyword(s):  
Thin Films ◽  
Thermal Diffusivity ◽  
Diffusivity Measurements
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