Sputtering of cobalt and chromium by argon and xenon ions near the threshold energy region

Sputtering yields of cobalt and chromium by argon and xenon ions with energies below 50 eV are reported. The targets were electroplated on copper substrates. Measurable sputtering yields were obtained from cobalt with ion energies as low as 10 eV. The ion beams were produced by an ion gun. A radioactive tracer technique was used for the quantitative measurement of the sputtering yield.57Co and 51Cr were used as tracers. The yield–energy curves are observed to be concave, which brings into question the practice of finding threshold energies by linear extrapolation.