EFFECT OF HELIUM GAS ON THE DEPOSITION OF DIAMOND LIKE CARBON THIN FILMS BY PULSED LASER ABLATION

We have studied the effects of ambient Helium gas pressure on the optical, structural and physical properties of the diamond like carbon thin films using a camphoric carbon (CC) soot target, deposited by pulsed laser ablation. Both the optical gap and electrical resistivity are found to increase with 2.6 Torr leads to a decre ase in optical gap and electrical resistivity. The films are further investigated by different spectroscopic techniques such as, Raman, XPS and FTIR spectroscopy, and surface morphological techniques like SEM and AFM. Improvement of the opto-electrical and structural properties of the diamondlike carbonaceous films deposited in helium environment using CC soot target reveal different behaviour than reported earlier.

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STRUCTURAL AND ELECTRICAL PROPERTIES OF DIAMOND-LIKE CARBON THIN FILMS PREPARED IN INERT GAS CONDITION

Surface Review and Letters ◽

10.1142/s0218625x05007712 ◽

2005 ◽

Vol 12 (05n06) ◽

pp. 691-696 ◽

Cited By ~ 3

Author(s):

M. RUSOP ◽

T. SOGA ◽

T. JIMBO ◽

M. UMENO ◽

M. SHARON

Keyword(s):

Thin Films ◽

Electrical Resistivity ◽

Electrical Properties ◽

Ambient Pressure ◽

Diamond Like Carbon ◽

Spectroscopic Techniques ◽

Optical Gap ◽

Structural And Electrical Properties ◽

Carbon Soot ◽

Carbon Thin Films

The effects of ambient helium gas pressure on the optical, structural and electrical properties of the diamond-like carbon thin films from camphoric carbon soot target, deposited by pulsed laser deposition have been studied. Optical gap and electrical resistivity are found to increase initially at low ambient pressure of 0.008 Torr. With further increase in ambient pressure up to 2.6 Torr, optical gap and electrical resistivity are found to decrease. The films are characterized for their structural properties using different spectroscopic techniques such as, XPS, Raman, and FTIR spectroscopy, and surface morphological techniques like SEM and AFM, and their electrical properties using four-probe resistance measurement.

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Electrical properties of boron-doped diamond-like carbon thin films deposited by femtosecond pulsed laser ablation

Applied Physics A ◽

10.1007/s00339-008-4893-4 ◽

2008 ◽

Vol 94 (1) ◽

pp. 105-109 ◽

Cited By ~ 18

Author(s):

A. Sikora ◽

A. Berkesse ◽

O. Bourgeois ◽

J.-L. Garden ◽

C. Guerret-Piécourt ◽

...

Keyword(s):

Thin Films ◽

Laser Ablation ◽

Electrical Properties ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Diamond Like Carbon ◽

Boron Doped Diamond ◽

Boron Doped ◽

Carbon Thin Films ◽

Femtosecond Pulsed Laser

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Physical and structural properties of carbon thin films deposited in two inert gases ambient by pulsed laser ablation using camphoric carbon target

Applied Surface Science ◽

10.1016/s0169-4332(02)00354-9 ◽

2002 ◽

Vol 197-198 ◽

pp. 426-431 ◽

Cited By ~ 6

Author(s):

M Rusop ◽

T Soga ◽

T Jimbo ◽

M Umeno

Keyword(s):

Thin Films ◽

Laser Ablation ◽

Structural Properties ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Inert Gases ◽

Carbon Target ◽

Carbon Thin Films

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Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100089652 ◽

1991 ◽

Vol 49 ◽

pp. 1068-1069

Author(s):

M. Grant Norton ◽

C. Barry Carter

Keyword(s):

Thin Film ◽

Thin Films ◽

Laser Ablation ◽

Substrate Surface ◽

Pulsed Laser ◽

Pulsed Laser Ablation ◽

Thin Film Deposition ◽

Film Deposition ◽

Laser Ablation Process ◽

Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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