Highty Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

1986 ◽  
Vol 25 (Part 2, No. 9) ◽  
pp. L776-L779 ◽  
Author(s):  
Tadatsugu Minami ◽  
Hirotoshi Sato ◽  
Hidehito Nanto ◽  
Shinzo Takata
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Silicon Doped

Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

1985 ◽  
Vol 24 (Part 2, No. 10) ◽  
pp. L781-L784 ◽  
Author(s):  
Tadatsugu Minami ◽  
Hirotoshi Sato ◽  
Hidehito Nanto ◽  
Shinzo Takata
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Group Iii ◽  
Impurity Doped
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