Room temperature deposition of zinc oxide thin films by rf-magnetron sputtering for application in solar cells

Mapping Intimacies ◽

10.1117/12.2238434 ◽

2016 ◽

Author(s):

Sanal K. C. ◽

R. R. Trujillo ◽

P. K. Nair ◽

M. T. S. Nair

Keyword(s):

Solar Cells ◽

Magnetron Sputtering ◽

Room Temperature ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Temperature Deposition

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Structural properties of nanorod zinc oxide thin films on Si substrate deposited by RF magnetron sputtering at room temperature

2013 IEEE International Conference on Smart Instrumentation, Measurement and Applications (ICSIMA) ◽

10.1109/icsima.2013.6717947 ◽

2013 ◽

Author(s):

A. K. Shafura ◽

N. D. Md Sin ◽

M. H. Mamat ◽

M Uzer ◽

A. Mohamad ◽

...

Keyword(s):

Magnetron Sputtering ◽

Structural Properties ◽

Room Temperature ◽

Rf Magnetron Sputtering ◽

Si Substrate ◽

Oxide Thin Films

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Wide Bandgap Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering at Room Temperature

IETE Journal of Research ◽

10.1080/03772063.2018.1506268 ◽

2018 ◽

Vol 66 (4) ◽

pp. 579-585 ◽

Author(s):

Gaurav Saxena ◽

Roy Paily

Keyword(s):

Magnetron Sputtering ◽

Room Temperature ◽

Rf Magnetron Sputtering ◽

Wide Bandgap ◽

Oxide Thin Films

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Influence of RF magnetron sputtering conditions on the properties of transparent conductive gallium-doped magnesium zinc oxide thin films

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.10.029 ◽

2013 ◽

Vol 231 ◽

pp. 539-542 ◽

Author(s):

Hsin-Chun Lu ◽

Jia-Chiuan Jou ◽

Chun-Lung Chu

Keyword(s):

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Magnesium Zinc Oxide

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Properties of double-layered Ga-doped Al-zinc-oxide/titanium-doped indium–tin-oxide thin films prepared by dc magnetron sputtering applied for Si-based thin film solar cells

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3651099 ◽

2011 ◽

Vol 29 (6) ◽

pp. 06B104

Author(s):

Chao-Chun Wang ◽

Dong-Sing Wuu ◽

Yang-Shih Lin ◽

Shui-Yang Lien ◽

Yung-Chuan Huang ◽

...

Keyword(s):

Thin Film ◽

Solar Cells ◽

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Thin Film Solar Cells ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films

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Room temperature DC magnetron sputtering deposition of hydrogenated aluminum doped zinc oxide thin films on polyethylene terephthalate substrates

Materials Letters ◽

10.1016/j.matlet.2013.05.063 ◽

2013 ◽

Vol 106 ◽

pp. 363-365 ◽

Author(s):

Ke Zhu ◽

Ye Yang ◽

Tiefeng Wei ◽

Ruiqin Tan ◽

Ping Cui ◽

...

Keyword(s):

Magnetron Sputtering ◽

Polyethylene Terephthalate ◽

Room Temperature ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films ◽

Sputtering Deposition ◽

Aluminum Doped Zinc Oxide

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Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.24.l781 ◽

1985 ◽

Vol 24 (Part 2, No. 10) ◽

pp. L781-L784 ◽

Author(s):

Tadatsugu Minami ◽

Hirotoshi Sato ◽

Hidehito Nanto ◽

Shinzo Takata

Keyword(s):

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Group Iii ◽

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Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application

Solid State Phenomena - Advances in Nanomaterials and Processing ◽

10.4028/3-908451-31-0.999 ◽

2007 ◽

pp. 999-1002

Author(s):

Han Na Cho ◽

Jang Woo Lee ◽

Su Ryun Min ◽

Chee Won Chung

Keyword(s):

Solar Cells ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Indium Zinc Oxide

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Characteristics of indium zinc oxide thin films prepared by direct current magnetron sputtering for flexible solar cells

Solar Energy Materials and Solar Cells ◽

10.1016/j.solmat.2010.02.016 ◽

2011 ◽

Vol 95 (1) ◽

pp. 264-269 ◽

Author(s):

Yu Bin Xiao ◽

Seon Mi Kong ◽

Eun Ho Kim ◽

Chee Won Chung

Keyword(s):

Solar Cells ◽

Magnetron Sputtering ◽

Direct Current ◽

Oxide Thin Films ◽

Indium Zinc Oxide ◽

Direct Current Magnetron Sputtering

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Synthesis and Characterization of B2O3-Doped Zinc Oxide Thin Films Prepared via RF-Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.228 ◽

2006 ◽

Vol 45 (1A) ◽

pp. 228-230 ◽

Author(s):

Chung-Hsin Lu ◽

Yu-Hsiang Huang ◽

Ashok Dhobale

Keyword(s):

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Synthesis And Characterization ◽

Oxide Thin Films

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Zinc Oxide Thin Films Deposited by RF Magnetron Sputtering on Mylar Substrates at Room Temperature

MRS Proceedings ◽

10.1557/proc-685-d5.10.1 ◽

2001 ◽

Vol 685 ◽

Author(s):

Elvira Fortunato ◽

Patrícia Nunes ◽

António Marques ◽

Daniel Costa ◽

Hugo Águas ◽

...

Keyword(s):

Magnetron Sputtering ◽

Room Temperature ◽

Low Cost ◽

Substrate Surface ◽

Hexagonal Wurtzite Structure ◽

Oxide Thin Films ◽

Axis Orientation

AbstractAluminium doped zinc oxide thin films (ZnO:Al) have been deposited on polyester (Mylar type D, 100 μm thickness) substrates at room temperature by r.f. magnetron sputtering. The structural, morphological, optical and electrical properties of the deposited films have been studied. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface. The ZnO:Al thin films with 85% transmittance in the visible and infra-red region and a resistivity as low as 3.6×10−2 ωcm have been obtained, as deposited. The obtained results are comparable to those ones obtained on glass substrates, opening a new field of low cost, light weight, small volume, flexible and unbreakable large area optoelectronic devices.

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