Low Temperature Deposition of(Ba,Sr)TiO3Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
1996 ◽
Vol 35
(Part 1, No. 9B)
◽
pp. 5089-5093
◽
Low‐Temperature Si Epitaxial Growth by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
1992 ◽
Vol 139
(7)
◽
pp. 1983-1988
◽
1999 ◽
Vol 38
(Part 1, No. 4B)
◽
pp. 2200-2204
◽
Radical Fluxes in Electron Cyclotron Resonance Plasma Chemical Vapor Deposition of Amorphous Silicon
1995 ◽
Vol 34
(Part 1, No. 11)
◽
pp. 5965-5970
◽
1997 ◽
Vol 36
(Part 2, No. 8A)
◽
pp. L986-L988
1996 ◽
Vol 35
(Part 2, No. 10A)
◽
pp. L1241-L1244
◽