Low‐Temperature Si Epitaxial Growth by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Epitaxial growth of silicon at low temperature by ultrahigh vacuum electron cyclotron resonance plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.342429 ◽

1988 ◽

Vol 64 (10) ◽

pp. 5183-5188 ◽

Cited By ~ 31

Author(s):

I. Nagai ◽

T. Takahagi ◽

A. Ishitani ◽

H. Kuroda ◽

M. Yoshikawa

Keyword(s):

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Electrical Properties of (Ba, Sr)TiO3Films on Ru Bottom Electrodes Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition at Extremely Low Temperature and Rapid Thermal Annealing

10.1143/jjap.38.2200 ◽

1999 ◽

Vol 38 (Part 1, No. 4B) ◽

pp. 2200-2204 ◽

Cited By ~ 6

Author(s):

Shuji Sone ◽

Reiko Akahane ◽

Koji Arita ◽

Hisato Yabuta ◽

Shintaro Yamamichi ◽

...

Keyword(s):

Electrical Properties ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Low Temperature Deposition of(Ba,Sr)TiO3Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

10.1143/jjap.35.5089 ◽

1996 ◽

Vol 35 (Part 1, No. 9B) ◽

pp. 5089-5093 ◽

Cited By ~ 15

Author(s):

Shuji Sone ◽

Hisato Yabuta ◽

Yoshitake Kato ◽

Toshihiro Iizuka ◽

Shintaro Yamamichi ◽

...

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Temperature Deposition ◽

Low temperature epitaxial growth of Ge using electron‐cyclotron‐resonance plasma‐assisted chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.351189 ◽

1992 ◽

Vol 71 (4) ◽

pp. 1949-1954 ◽

Cited By ~ 3

Author(s):

W. J. Varhue ◽

J. M. Carulli ◽

G. G. Peterson ◽

J. A. Miller

Keyword(s):

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Radical Fluxes in Electron Cyclotron Resonance Plasma Chemical Vapor Deposition of Amorphous Silicon

10.1143/jjap.34.5965 ◽

1995 ◽

Vol 34 (Part 1, No. 11) ◽

pp. 5965-5970 ◽

Cited By ~ 3

Author(s):

Mei Zhang ◽

Yoshikazu Nakayama

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Behavior of charged particles in an electron cyclotron resonance plasma chemical vapor deposition reactor

Applied Physics Letters ◽

10.1063/1.103892 ◽

1990 ◽

Vol 57 (22) ◽

pp. 2297-2299 ◽

Cited By ~ 4

Author(s):

Yoshikazu Nakayama ◽

Mitsuru Kondoh ◽

Kohji Hitsuishi ◽

Mei Zhang ◽

Takao Kawamura

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Charged Particles ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Study on the electron cyclotron resonance plasma chemical vapor deposition of carbon nanotubes

Materials Science and Engineering B ◽

10.1016/j.mseb.2007.03.008 ◽

2007 ◽

Vol 140 (1-2) ◽

pp. 44-47

Author(s):

Zhi Wang ◽

Dechun Ba ◽

Peijiang Cao ◽

ChunhongYu ◽

Ji Liang

Keyword(s):

Carbon Nanotubes ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Epitaxial growth of B-doped Si on Si(100) by electron-cyclotron-resonance Ar plasma chemical vapor deposition in a SiH4–B2H6–H2 gas mixture without substrate heating

Thin Solid Films ◽

10.1016/j.tsf.2013.08.118 ◽

2014 ◽

Vol 557 ◽

pp. 10-13 ◽

Cited By ~ 4

Author(s):

Yusuke Abe ◽

Masao Sakuraba ◽

Junichi Murota

Keyword(s):

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Gas Mixture ◽

Plasma Chemical ◽

Substrate Heating

A Study on the Relation between Film Quality and Deposition Rate for Amorphous Silicon Films Grown by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition Using H 2/SiH 4

10.1143/jjap.36.l986 ◽

1997 ◽

Vol 36 (Part 2, No. 8A) ◽

pp. L986-L988

Author(s):

Moonsang Kang ◽

Jaeyeong Kim ◽

Taehoon Lim ◽

Inhwan Oh ◽

Bupju Jeon ◽

...

Keyword(s):

Amorphous Silicon ◽

Deposition Rate ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Electron cyclotron resonance plasma chemical vapor deposition for rugate film manufacturing

10.1117/12.192121 ◽

1994 ◽

Cited By ~ 1

Author(s):

Pavel V. Bulkin ◽

Pieter L. Swart ◽

Beatrys M. Lacquet

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽