Low Temperature Nucleation of the Perovskite Phase in the Deposition of Pb(Zr,Ti)O 3 Films on the Pt/SiO 2/Si Substrate by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Perovskite Phase ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Si Substrate ◽

Low‐temperature homoepitaxial growth of Si by electron cyclotron resonance plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114962 ◽

1995 ◽

Vol 67 (7) ◽

pp. 971-973 ◽

Cited By ~ 21

Author(s):

J. L. Rogers ◽

P. S. Andry ◽

W. J. Varhue ◽

P. McGaughnea ◽

E. Adams ◽

...

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Homoepitaxial Growth ◽

Low temperature epitaxial growth of Ge using electron‐cyclotron‐resonance plasma‐assisted chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.351189 ◽

1992 ◽

Vol 71 (4) ◽

pp. 1949-1954 ◽

Cited By ~ 3

Author(s):

W. J. Varhue ◽

J. M. Carulli ◽

G. G. Peterson ◽

J. A. Miller

Keyword(s):

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.22.l210 ◽

1983 ◽

Vol 22 (Part 2, No. 4) ◽

pp. L210-L212 ◽

Cited By ~ 289

Author(s):

Seitaro Matsuo ◽

Mikiho Kiuchi

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Low temperature growth of fluorinated oxides using Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

10.31274/rtd-20210128-16 ◽

2001 ◽

Author(s):

Roger Graham Keen

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Temperature Growth ◽

Low Temperature Growth ◽

Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2069437 ◽

1992 ◽

Vol 139 (5) ◽

pp. 1489-1495 ◽

Cited By ~ 29

Author(s):

F. Plais ◽

B. Agius ◽

F. Abel ◽

J. Siejka ◽

M. Puech ◽

...

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Temperature Deposition ◽

ChemInform Abstract: Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.199230253 ◽

2010 ◽

Vol 23 (30) ◽

pp. no-no

Author(s):

F. PLAIS ◽

B. AGIUS ◽

F. ABEL ◽

J. SIEJKA ◽

M. PUECH ◽

...

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Temperature Deposition ◽

Low-temperature epitaxial growth of AlN films on sapphire by electron cyclotron resonance plasma-assisted chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(93)90867-v ◽

1993 ◽

Vol 130 (1-2) ◽

pp. 308-312 ◽

Cited By ~ 23

Author(s):

Wei Zhang ◽

Yoshihiro Someno ◽

Makoto Sasaki ◽

Toshio Hirai

Keyword(s):

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Low-Temperature Formation of Device-Quality SiO2/Si Interfaces Using Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.4171 ◽

2001 ◽

Vol 40 (Part 1, No. 6A) ◽

pp. 4171-4175 ◽

Cited By ~ 12

Author(s):

Seiichiro Higashi ◽

Daisuke Abe ◽

Satoshi Inoue ◽

Tatsuya Shimoda

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Comparison of (CH4O2)bH2 and COH2 plasmas for low temperature diamond film deposition by electron cyclotron resonance plasma-assisted chemical vapor deposition

Diamond and Related Materials ◽

10.1016/0925-9635(94)90039-6 ◽

1994 ◽

Vol 3 (1-2) ◽

pp. 105-111 ◽

Cited By ~ 8

Author(s):

C.R. Eddy ◽

D.L. Youchison ◽

B.D. Sartwell

Keyword(s):

Low Temperature ◽

Diamond Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Film Deposition ◽

Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽