Effects of Peaking Capacitor in a Copper Bromide Vapor Laser

1999 ◽  
Vol 38 (Part 1, No. 2A) ◽  
pp. 773-774
Author(s):  
Teckyong Tou ◽  
Weeong Siew ◽  
Kwongkeong Tham
Keyword(s):  
2021 ◽  
pp. 127363
Author(s):  
I.K. Kostadinov ◽  
K.A. Temelkov ◽  
D.N. Astadjov ◽  
S.I. Slaveeva ◽  
G.P. Yankov ◽  
...  

Author(s):  
N.V. Sabotinov ◽  
K.D. Dimitrov ◽  
N.K. Vuchkov ◽  
D.N. Astadjov ◽  
V.K. Kirkov

1993 ◽  
Vol 334 ◽  
Author(s):  
B. Ivanov ◽  
C. Popov ◽  
V. Shanov ◽  
D. Filipov

AbstractMaskless deposition of silicon from silane on Si monocrystalline wafer using copper bromide vapor laser (CBVL) is investigated. Morphology and geometric parameters of the stripes obtained are studied and some conclusions for the process mechanism are made. Applying Kirchoff's transform and Green's function analysis nonlinear heat diffusion problem for different pulse shapes was solved. The influence of pulse shape on the temperature distribution and its time evolution was studied. Nonisothermal and non-stationary deposition kinetic models using the obtained results were developed.


2013 ◽  
Vol 56 (3) ◽  
pp. 349-352 ◽  
Author(s):  
A. G. Filonov ◽  
D. V. Shiyanov
Keyword(s):  

2016 ◽  
Vol 59 (3) ◽  
pp. 381-384 ◽  
Author(s):  
V. O. Troitsky ◽  
V. A. Dimaki ◽  
A. G. Filonov

1984 ◽  
Vol 14 (4) ◽  
pp. 544-547 ◽  
Author(s):  
D A Astadzhov ◽  
N K Vuchkov ◽  
G G Petrash ◽  
N V Sabotinov

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