High-power copper bromide vapor laser

2021 ◽  
pp. 127363
Author(s):  
I.K. Kostadinov ◽  
K.A. Temelkov ◽  
D.N. Astadjov ◽  
S.I. Slaveeva ◽  
G.P. Yankov ◽  
...  
1996 ◽  
Author(s):  
Krasimir D. Dimitrov ◽  
Nikola V. Sabotinov

1979 ◽  
Vol 30 (1) ◽  
pp. 70-74 ◽  
Author(s):  
I. Smilanski ◽  
G. Erez ◽  
A. Kerman ◽  
L.A. Levin

1991 ◽  
Author(s):  
Nobutada Aoki ◽  
Hironobu Kimura ◽  
Chikara Konagai ◽  
Shimpey Shirayama ◽  
Tatsuo Miyazawa ◽  
...  

2000 ◽  
Author(s):  
Hironobu Kimura ◽  
Nobutada Aoki ◽  
Noriyasu Kobayashi ◽  
Chikara Konagai ◽  
Eiji Seki ◽  
...  

1999 ◽  
Vol 38 (Part 1, No. 2A) ◽  
pp. 773-774
Author(s):  
Teckyong Tou ◽  
Weeong Siew ◽  
Kwongkeong Tham
Keyword(s):  

Author(s):  
N.V. Sabotinov ◽  
K.D. Dimitrov ◽  
N.K. Vuchkov ◽  
D.N. Astadjov ◽  
V.K. Kirkov

1993 ◽  
Vol 334 ◽  
Author(s):  
B. Ivanov ◽  
C. Popov ◽  
V. Shanov ◽  
D. Filipov

AbstractMaskless deposition of silicon from silane on Si monocrystalline wafer using copper bromide vapor laser (CBVL) is investigated. Morphology and geometric parameters of the stripes obtained are studied and some conclusions for the process mechanism are made. Applying Kirchoff's transform and Green's function analysis nonlinear heat diffusion problem for different pulse shapes was solved. The influence of pulse shape on the temperature distribution and its time evolution was studied. Nonisothermal and non-stationary deposition kinetic models using the obtained results were developed.


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