A power supply for a copper bromide vapor laser

2016 ◽  
Vol 59 (3) ◽  
pp. 381-384 ◽  
Author(s):  
V. O. Troitsky ◽  
V. A. Dimaki ◽  
A. G. Filonov
2021 ◽  
pp. 127363
Author(s):  
I.K. Kostadinov ◽  
K.A. Temelkov ◽  
D.N. Astadjov ◽  
S.I. Slaveeva ◽  
G.P. Yankov ◽  
...  

1999 ◽  
Vol 38 (Part 1, No. 2A) ◽  
pp. 773-774
Author(s):  
Teckyong Tou ◽  
Weeong Siew ◽  
Kwongkeong Tham
Keyword(s):  

1991 ◽  
Author(s):  
Takashi Fujii ◽  
Koshichi Nemoto ◽  
Rikio Ishikawa ◽  
Kazuo Hayashi ◽  
Etsuo Noda

Author(s):  
N.V. Sabotinov ◽  
K.D. Dimitrov ◽  
N.K. Vuchkov ◽  
D.N. Astadjov ◽  
V.K. Kirkov

1993 ◽  
Vol 334 ◽  
Author(s):  
B. Ivanov ◽  
C. Popov ◽  
V. Shanov ◽  
D. Filipov

AbstractMaskless deposition of silicon from silane on Si monocrystalline wafer using copper bromide vapor laser (CBVL) is investigated. Morphology and geometric parameters of the stripes obtained are studied and some conclusions for the process mechanism are made. Applying Kirchoff's transform and Green's function analysis nonlinear heat diffusion problem for different pulse shapes was solved. The influence of pulse shape on the temperature distribution and its time evolution was studied. Nonisothermal and non-stationary deposition kinetic models using the obtained results were developed.


1994 ◽  
Vol 65 (2) ◽  
pp. 323-326 ◽  
Author(s):  
H. Seki ◽  
T. Oohashi ◽  
T. Shirakura ◽  
S. Takemori ◽  
Y. Midorikawa ◽  
...  

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