Pyrolytic Lcvd of Silicon Using A Pulsed Visible Laser - Experiment and Modelling
Keyword(s):
AbstractMaskless deposition of silicon from silane on Si monocrystalline wafer using copper bromide vapor laser (CBVL) is investigated. Morphology and geometric parameters of the stripes obtained are studied and some conclusions for the process mechanism are made. Applying Kirchoff's transform and Green's function analysis nonlinear heat diffusion problem for different pulse shapes was solved. The influence of pulse shape on the temperature distribution and its time evolution was studied. Nonisothermal and non-stationary deposition kinetic models using the obtained results were developed.
1999 ◽
Vol 38
(Part 1, No. 2A)
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pp. 773-774
2010 ◽
Vol 2010.20
(0)
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pp. _3105-1_-_3105-5_
2020 ◽
Vol 878
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pp. 012022
2014 ◽
Vol 2014
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pp. 1-11
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