Model of Transfer Waiting Time and Simulation Analysis

Author(s):  
Yun Su ◽  
Liying Wei
2019 ◽  
Vol 8 (1) ◽  
pp. 9-18
Author(s):  
Rika Listiyani ◽  
Lilik Linawati ◽  
Leopoldus Ricky Sasongko

The focus of this research is to analyze the production process queuing system at one of the stages of production of swiftlet nest in analytical and simulation. The purpose of this research is to obtain the model and characteristics of the queue system at the Finishing-2. The analysis uses data on the rate of arrival and the rate of service based on real observation and determines the probability distribution of data between arrival time and service time using the Easyfit 3.0 program, to get the model of the queuing system is obtained. After the model obtained, analytic and simulation analysis is carried out using the Queuing System Simulation (QSS) module in the WINQSB software. The results of the queuing system characteristics in the analytical and simulation have a significant difference, because the distribution of time between arrivals and service times used in analytical calculations is G (general), while the simulation uses a distribution that refers to a particular type of distribution according to the results of the Easyfit program. Simulation is carried out with the FIFO and SIRO queue disciplines. The simulation results show that 91% of the characteristics of the queue system in the two queue disciplines do not have a significant difference. Moreover, it has also been done a comparison between the characteristics of the queuing system in two different work areas namely Room A and Room B&C, based on the simulation results, the results show 58% of the characteristics of the queuing system have a significant difference, this is due to differences in service time between the two work areas. Thus the purpose of this research has been achieved which is obtained by the queue model (G/G/c):(FIFO/∞/∞), and also obtained system performance improvements, in the form of waiting time in the queue where the waiting time in Room B&C is smaller than Room A. Keywords: Queuing, Arrival, Service, Production, Simulation.


2001 ◽  
Vol 120 (5) ◽  
pp. A370-A370
Author(s):  
C BOBROWSKI ◽  
H GHADIMPOOR ◽  
M STENECK ◽  
X ROGIERS ◽  
C BROELSCH ◽  
...  
Keyword(s):  

Optimization ◽  
1973 ◽  
Vol 4 (6) ◽  
pp. 453-462
Author(s):  
L. Cunningham ◽  
N. Singh

2014 ◽  
Author(s):  
A.M.L. Westin ◽  
C.L. Barksdale ◽  
S.H. Stephan

Nature ◽  
2010 ◽  
Author(s):  
Apoorva Mandavilli
Keyword(s):  

2020 ◽  
Vol 90 (3) ◽  
pp. 30502
Author(s):  
Alessandro Fantoni ◽  
João Costa ◽  
Paulo Lourenço ◽  
Manuela Vieira

Amorphous silicon PECVD photonic integrated devices are promising candidates for low cost sensing applications. This manuscript reports a simulation analysis about the impact on the overall efficiency caused by the lithography imperfections in the deposition process. The tolerance to the fabrication defects of a photonic sensor based on surface plasmonic resonance is analysed. The simulations are performed with FDTD and BPM algorithms. The device is a plasmonic interferometer composed by an a-Si:H waveguide covered by a thin gold layer. The sensing analysis is performed by equally splitting the input light into two arms, allowing the sensor to be calibrated by its reference arm. Two different 1 × 2 power splitter configurations are presented: a directional coupler and a multimode interference splitter. The waveguide sidewall roughness is considered as the major negative effect caused by deposition imperfections. The simulation results show that plasmonic effects can be excited in the interferometric waveguide structure, allowing a sensing device with enough sensitivity to support the functioning of a bio sensor for high throughput screening. In addition, the good tolerance to the waveguide wall roughness, points out the PECVD deposition technique as reliable method for the overall sensor system to be produced in a low-cost system. The large area deposition of photonics structures, allowed by the PECVD method, can be explored to design a multiplexed system for analysis of multiple biomarkers to further increase the tolerance to fabrication defects.


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