Low Temperature Deposition of TiN Using Tetrakis(dimethylamido)‐Titanium in an Electron Cyclotron Resonance Plasma Process

Journal of The Electrochemical Society ◽

10.1149/1.2054820 ◽

1994 ◽

Vol 141 (3) ◽

pp. 849-853 ◽

Author(s):

A. Weber ◽

R. Nikulski ◽

C. ‐P. Klages ◽

M. E. Gross ◽

W. L. Brown ◽

...

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Process ◽

Electron Cyclotron Resonance Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Resonance Plasma

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ChemInform Abstract: Low Temperature Deposition of TiN Using Tetrakis(dimethylamido)- Titanium in an Electron Cyclotron Resonance Plasma Process.

10.1002/chin.199425027 ◽

2010 ◽

Vol 25 (25) ◽

pp. no-no

Author(s):

A. WEBER ◽

R. NIKULSKI ◽

C.-P. KLAGES ◽

M. E. GROSS ◽

W. L. BROWN ◽

...

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Process ◽

Electron Cyclotron Resonance Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Resonance Plasma

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Low-temperature deposition of high-quality silicon dioxide films by sputtering-type electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580664 ◽

1997 ◽

Vol 15 (4) ◽

pp. 1951-1954 ◽

Author(s):

H. Nakashima ◽

K. Furukawa ◽

Y. C. Liu ◽

D. W. Gao ◽

Y. Kashiwazaki ◽

...

Keyword(s):

Low Temperature ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Quality ◽

Electron Cyclotron Resonance Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Resonance Plasma

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Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2069437 ◽

1992 ◽

Vol 139 (5) ◽

pp. 1489-1495 ◽

Author(s):

F. Plais ◽

B. Agius ◽

F. Abel ◽

J. Siejka ◽

M. Puech ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Deposition ◽

Resonance Plasma

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ChemInform Abstract: Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition.

10.1002/chin.199230253 ◽

2010 ◽

Vol 23 (30) ◽

pp. no-no

Author(s):

F. PLAIS ◽

B. AGIUS ◽

F. ABEL ◽

J. SIEJKA ◽

M. PUECH ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Deposition ◽

Resonance Plasma

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Effect of Ion Mass and Ion Energy on Low-Temperature Deposition of Polycrystalline-Si Thin Film on SiO2Layer by Using Sputtering-Type Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.l511 ◽

2003 ◽

Vol 42 (Part 2, No. 5B) ◽

pp. L511-L513 ◽

Author(s):

Junli Wang ◽

Taishi Saitou ◽

Youhei Sugimoto ◽

Dong Wang ◽

Liwei Zhao ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Deposition ◽

Resonance Plasma ◽

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Deposition of high‐quality TiN using tetra‐isopropoxide titanium in an electron cyclotron resonance plasma process

Applied Physics Letters ◽

10.1063/1.114847 ◽

1995 ◽

Vol 67 (20) ◽

pp. 2934-2935 ◽

Author(s):

A. Weber ◽

R. Poeckelmann ◽

C.‐P. Klages

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Process ◽

High Quality ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Low‐temperature homoepitaxial growth of Si by electron cyclotron resonance plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114962 ◽

1995 ◽

Vol 67 (7) ◽

pp. 971-973 ◽

Author(s):

J. L. Rogers ◽

P. S. Andry ◽

W. J. Varhue ◽

P. McGaughnea ◽

E. Adams ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Homoepitaxial Growth ◽

Resonance Plasma

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Deposition of low temperature Si-based insulators by the electron cyclotron resonance plasma method

Thin Solid Films ◽

10.1016/s0040-6090(97)00510-5 ◽

1998 ◽

Vol 317 (1-2) ◽

pp. 116-119 ◽

Author(s):

S Garcia ◽

J.M Martin ◽

I Martil ◽

M Fernandez ◽

G Gonzalez-Diaz

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Method ◽

Resonance Plasma

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Low-Temperature Si Surface Cleaning by Hydrogen Beam with Electron-Cyclotron-Resonance Plasma Excitation

Japanese Journal of Applied Physics ◽

10.1143/jjap.29.l1181 ◽

1990 ◽

Vol 29 (Part 2, No. 7) ◽

pp. L1181-L1184 ◽

Author(s):

Tomohiro Shibata ◽

Yasushi Nanishi ◽

Masatomo Fujimoto

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Surface Cleaning ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Excitation ◽

Hydrogen Beam ◽

Resonance Plasma

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Low temperature epitaxial growth of Ge using electron‐cyclotron‐resonance plasma‐assisted chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.351189 ◽

1992 ◽

Vol 71 (4) ◽

pp. 1949-1954 ◽

Author(s):

W. J. Varhue ◽

J. M. Carulli ◽

G. G. Peterson ◽

J. A. Miller

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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