Development of Techniques for Real‐Time Monitoring and Control in Plasma Etching: I . Response Surface Modeling of and Etching of Silicon and Silicon Dioxide

1991 ◽  
Vol 138 (3) ◽  
pp. 789-799 ◽  
Author(s):  
K. J. McLaughlin ◽  
S. W. Butler ◽  
T. F. Edgar ◽  
I. Trachtenberg
Keyword(s):  
Silicon Dioxide ◽  
Response Surface ◽  
Real Time ◽  
Plasma Etching ◽  
Surface Modeling ◽  
Response Surface Modeling ◽  
Monitoring And Control ◽  
Real Time Monitoring ◽  
And Control

Real-Time Monitoring and Control of Plasma Etching

1998 ◽  
Vol 37 (Part 1, No. 4B) ◽  
pp. 2381-2387 ◽  
Author(s):  
Moshe Sarfaty ◽  
Chris Baum ◽  
Michael Harper ◽  
Noah Hershkowitz ◽  
Juda L. Shohet
Keyword(s):  
Real Time ◽  
Plasma Etching ◽  
Monitoring And Control ◽  
Real Time Monitoring ◽  
And Control

Real-time monitoring and control of plasma etching

1991 ◽  
Author(s):  
Stephanie W. Butler ◽  
Kevin J. McLaughlin ◽  
Thomas F. Edgar ◽  
Isaac Trachtenberg
Keyword(s):  
Real Time ◽  
Plasma Etching ◽  
Monitoring And Control ◽  
Real Time Monitoring ◽  
And Control
Sign in / Sign up

Export Citation Format

Share Document