Novel Surface-Wave-Excited Plasma-Enhanced CVD System with Reciprocating Substrate Motion

2019 ◽  
Vol 28 (15) ◽  
pp. 27-33 ◽  
Author(s):  
Kazufumi Azuma ◽  
Satoko Ueno ◽  
Masayasu Suzuki ◽  
Yoshiyuki Konishi ◽  
Shinichiro Ishida

Author(s):  
W.J. de Ruijter ◽  
M.R. McCartney ◽  
David J. Smith ◽  
J.K. Weiss

Further advances in resolution enhancement of transmission electron microscopes can be expected from digital processing of image data recorded with slow-scan CCD cameras. Image recording with these new cameras is essential because of their high sensitivity, extreme linearity and negligible geometric distortion. Furthermore, digital image acquisition allows for on-line processing which yields virtually immediate reconstruction results. At present, the most promising techniques for exit-surface wave reconstruction are electron holography and the recently proposed focal variation method. The latter method is based on image processing applied to a series of images recorded at equally spaced defocus.Exit-surface wave reconstruction using the focal variation method as proposed by Van Dyck and Op de Beeck proceeds in two stages. First, the complex image wave is retrieved by data extraction from a parabola situated in three-dimensional Fourier space. Then the objective lens spherical aberration, astigmatism and defocus are corrected by simply dividing the image wave by the wave aberration function calculated with the appropriate objective lens aberration coefficients which yields the exit-surface wave.



1989 ◽  
Vol 1 (1) ◽  
pp. 247-265
Author(s):  
Joseph Rose ◽  
Aleksander Pilarski ◽  
Yimei Huang
Keyword(s):  


1990 ◽  
Vol 137 (6) ◽  
pp. 467 ◽  
Author(s):  
M. Kirci ◽  
E. Akcakaya
Keyword(s):  


1998 ◽  
Vol 08 (PR7) ◽  
pp. Pr7-195-Pr7-203
Author(s):  
Y. Yoshida


1972 ◽  
Vol 33 (C6) ◽  
pp. C6-196-C6-201
Author(s):  
W. C. WANG ◽  
P. DAS




2009 ◽  
Vol 129 (1) ◽  
pp. 30-34
Author(s):  
Mrityunjai Kumar Singh ◽  
Lei Xu ◽  
Akihisa Ogino ◽  
Masaaki Nagatsu


2003 ◽  
Vol 772 ◽  
Author(s):  
Masakazu Muroyama ◽  
Kazuto Kimura ◽  
Takao Yagi ◽  
Ichiro Saito

AbstractA carbon nanotube triode using Helicon Plasma-enhanced CVD with electroplated NiCo catalyst has been successfully fabricated. Isolated NiCo based metal catalyst was deposited at the bottom of the cathode wells by electroplating methods to control the density of carbon nanotubes and also reduce the activation energy of its growth. Helicon Plasma-enhanced CVD (HPECVD) has been used to deposit nanotubes at 400°C. Vertically aligned carbon nanotubes were then grown selectively on the electroplated Ni catalyst. Field emission measurements were performed with a triode structure. At a cathode to anode gap of 1.1mm, the turn on voltage for the gate was 170V.



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