scholarly journals Electrical and Materials Characterization of HfO2 and ZrO2 Thin Films for High-K Gate Applications Deposited by ALD in a 300 mm Reactor

2008 ◽  
Keyword(s):  
Thin Films ◽  
Materials Characterization ◽  
High K

Fabrication and Characterization of High-k Dielectric Nickel Titanate Thin Films Using a Modified Sol-Gel Method

2010 ◽  
Vol 94 (1) ◽  
pp. 250-254 ◽  
Author(s):  
Shiow-Huey Chuang ◽  
Min-Lung Hsieh ◽  
Shih-Chieh Wu ◽  
Hong-Cai Lin ◽  
Tien-Sheng Chao ◽  
...  
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Gel Method ◽  
Sol Gel Method ◽  
High K ◽  
Nickel Titanate ◽  
Fabrication And Characterization ◽  
High K Dielectric

Characterization of Amorphous High-k Thin Films by EXAFS and GIXS

2007 ◽  
Author(s):  
Momoko Takemura ◽  
Hideyuki Yamazaki ◽  
Hirobumi Ohmori ◽  
Masahiko Yoshiki ◽  
Shiro Takeno ◽  
...  
Keyword(s):  
Thin Films ◽  
High K

Fabrication and Electrical Characterization of High-k LaGdO3 Thin Films and Field Effect Transistors

2019 ◽  
Vol 35 (2) ◽  
pp. 297-304 ◽  
Author(s):  
Shojan P. Pavunny ◽  
R. Thomas ◽  
T.S. Kalkur ◽  
Jurgen Schubert ◽  
E. Fachini ◽  
...  
Keyword(s):  
Thin Films ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Electrical Characterization ◽  
High K
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