Spectroscopic ellipsometry characterization of high-k dielectric HfO2 thin films and the high-temperature annealing effects on their optical properties

2002 ◽  
Vol 80 (7) ◽  
pp. 1249-1251 ◽  
Author(s):  
Yong Jai Cho ◽  
N. V. Nguyen ◽  
C. A. Richter ◽  
J. R. Ehrstein ◽  
Byoung Hun Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
High Temperature ◽  
Spectroscopic Ellipsometry ◽  
High Temperature Annealing ◽  
High K ◽  
Annealing Effects ◽  
High K Dielectric

Fabrication and Characterization of High-k Dielectric Nickel Titanate Thin Films Using a Modified Sol-Gel Method

2010 ◽  
Vol 94 (1) ◽  
pp. 250-254 ◽  
Author(s):  
Shiow-Huey Chuang ◽  
Min-Lung Hsieh ◽  
Shih-Chieh Wu ◽  
Hong-Cai Lin ◽  
Tien-Sheng Chao ◽  
...  
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Gel Method ◽  
Sol Gel Method ◽  
High K ◽  
Nickel Titanate ◽  
Fabrication And Characterization ◽  
High K Dielectric

Atomic layer-by-layer MOCVD of high-k dielectric thin films with in-situ monitoring by spectroscopic ellipsometry

2002 ◽  
Author(s):  
Yoshishige Tsuchiya ◽  
Masato Endoh ◽  
Masatoshi Kurosawa ◽  
Raymond T. Tung ◽  
Takeo Hattori ◽  
...  
Keyword(s):  
Thin Films ◽  
Spectroscopic Ellipsometry ◽  
Atomic Layer ◽  
In Situ Monitoring ◽  
Layer By Layer ◽  
Dielectric Thin Films ◽  
High K ◽  
High K Dielectric

High temperature annealing effects on chromel (Ni90Cr10) thin films and interdiffusion study for sensing applications

2008 ◽  
Vol 516 (12) ◽  
pp. 4307-4311 ◽  
Author(s):  
Arindom Datta ◽  
Xudong Cheng ◽  
Michael A. Miller ◽  
Xiaochun Li
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
High Temperature Annealing ◽  
Sensing Applications ◽  
Annealing Effects

FT-IR analysis of high temperature annealing effects in a-SiC:H thin films

2017 ◽  
Author(s):  
Tobias Frischmuth ◽  
Michael Schneider ◽  
Thomas Grille ◽  
U. Schmid
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
High Temperature Annealing ◽  
Annealing Effects ◽  
Ft Ir ◽  
Ir Analysis
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