Progress in X-Ray Fluorescence Correction Methods Using Scattered Radiation

1978 ◽  
Vol 22 ◽  
pp. 303-315
Author(s):  
K. K. Nielson
Keyword(s):  
Scattered Radiation ◽  
Matrix Correction ◽  
X Ray ◽  
Analytical Applications

This paper reviews x-ray fluorescence (XRF) matrix correction methods which use scattered radiation and discusses their typical analytical applications. It also discusses some of the underlying assumptions of these methods and thus provides a basis for estimating their merits and limitations in quantitative analytical applications.

Computer programs for the calculation of x-ray intensities emitted by elements in multi-layer structures

1990 ◽  
Vol 48 (2) ◽  
pp. 216-217
Author(s):  
G.F. Bastin ◽  
H.J.M. Heijligers ◽  
J.M. Dijkstra
Keyword(s):  
Software Package ◽  
Light Element ◽  
Matrix Correction ◽  
Excellent Performance ◽  
Element Analysis ◽  
X Ray ◽  
Know How ◽  
Accurate Knowledge ◽  
Layer Structures ◽  
Bulk Matrix

For the calculation of X-ray intensities emitted by elements present in multi-layer systems it is vital to have an accurate knowledge of the x-ray ionization vs. mass-depth (ϕ(ρz)) curves as a function of accelerating voltage and atomic number of films and substrate. Once this knowledge is available the way is open to the analysis of thin films in which both the thicknesses as well as the compositions can usually be determined simultaneously.Our bulk matrix correction “PROZA” with its proven excellent performance for a wide variety of applications (e.g., ultra-light element analysis, extremes in accelerating voltage) has been used as the basis for the development of the software package discussed here. The PROZA program is based on our own modifications of the surface-centred Gaussian ϕ(ρz) model, originally introduced by Packwood and Brown. For its extension towards thin film applications it is required to know how the 4 Gaussian parameters α, β, γ and ϕ(o) for each element in each of the films are affected by the film thickness and the presence of other layers and the substrate.

Embracing Uncertainty: Modeling Uncertainty in EPMA—Part II

2021 ◽  
Vol 27 (1) ◽  
pp. 74-89
Author(s):  
Nicholas W.M. Ritchie
Keyword(s):  
Beam Energy ◽  
Uncertainty Modeling ◽  
Matrix Correction ◽  
Correction Model ◽  
X Ray ◽  
Starting Point ◽  
Uncertainty Calculation ◽  
The Matrix ◽  
Measurement Design ◽  
New Framework

AbstractThis, the second in a series of articles present a new framework for considering the computation of uncertainty in electron excited X-ray microanalysis measurements, will discuss matrix correction. The framework presented in the first article will be applied to the matrix correction model called “Pouchou and Pichoir's Simplified Model” or simply “XPP.” This uncertainty calculation will consider the influence of beam energy, take-off angle, mass absorption coefficient, surface roughness, and other parameters. Since uncertainty calculations and measurement optimization are so intimately related, it also provides a starting point for optimizing accuracy through choice of measurement design.

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