The work is devoted to an experimental study of the effectiveness of the method for measuring errors in manufacturing of computer-generated synthesized holograms using specialized marks. Each mark represents two aligned diffraction gratings with the same duty cycle and period, the first of which is formed before writing, and the second is formed in the process of forming the structure of the hologram. To determine the writing error, the method of optical diffractometry was used. The results of an experimental study of dependence of diffraction efficiency of the mark on the mutual displacement of parts of the microgratings are presented. The error manufacturing of a synthesized hologram arising during long-term writing of a diffractive optical element has been simulated experimentally.
A single diffractive optical element implementing spectrum-splitting and beam-concentration functions simultaneously with high diffraction efficiency
