Elimination of spatial hole burning in solid-state lasers using nanostructured thin films

2019 ◽  
Vol 59 (5) ◽  
pp. A83 ◽  
Author(s):  
Jean-François Bisson ◽  
Koffi Novignon Amouzou
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Hole Burning ◽  
Solid State Lasers ◽  
Spatial Hole Burning ◽  
Nanostructured Thin Films

Continuous-wave mode-locked solid-state lasers with enhanced spatial hole burning

1995 ◽  
Vol 61 (5) ◽  
pp. 429-437 ◽  
Author(s):  
B. Braun ◽  
K. J. Weingarten ◽  
F. X. K�rtner ◽  
U. Keller
Keyword(s):  
Solid State ◽  
Continuous Wave ◽  
Wave Mode ◽  
Hole Burning ◽  
Solid State Lasers ◽  
Spatial Hole Burning ◽  
Continuous Wave Mode

Selective pumping and spatial hole burning for generation of photon wave packets with ray-wave duality in solid-state lasers

2015 ◽  
Vol 13 (2) ◽  
pp. 025001 ◽  
Author(s):  
J C Tung ◽  
H C Liang ◽  
P H Tuan ◽  
F L Chang ◽  
K F Huang ◽  
...  
Keyword(s):  
Solid State ◽  
Wave Packets ◽  
Hole Burning ◽  
Solid State Lasers ◽  
Spatial Hole Burning

scholarly journals Bi-continuous pattern formation in thin films via solid-state interfacial dealloying studied by multimodal characterization

2019 ◽  
Vol 6 (10) ◽  
pp. 1991-2002 ◽  
Author(s):  
Chonghang Zhao ◽  
Kim Kisslinger ◽  
Xiaojing Huang ◽  
Ming Lu ◽  
Fernando Camino ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Storage ◽  
Solid State ◽  
Pattern Formation ◽  
Nanostructured Thin Films ◽  
Biomedical Sensing ◽  
Potential Applications

Solid-state interfacial dealloying creates bi-continuous nanostructured thin films with 3D interconnected morphology, revealed by multimodal characterization, offering potential applications in catalysis, biomedical sensing and energy storage.

scholarly journals Kinetic pathways of diffusion and solid-state reactions in nanostructured thin films

2013 ◽  
Vol 93 (16) ◽  
pp. 1960-1970 ◽  
Author(s):  
D.L. Beke ◽  
G.A. Langer ◽  
G. Molnár ◽  
G. Erdélyi ◽  
G.L. Katona ◽  
...  
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Solid State Reactions ◽  
Nanostructured Thin Films

TEM studies of solid-state reactions in sputter-deposited Nb/Al multilayer thin films

1996 ◽  
Vol 54 ◽  
pp. 1020-1021
Author(s):  
F. Ma ◽  
S. Vivekanand ◽  
K. Barmak ◽  
C. Michaelsen
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Stoichiometric Composition ◽  
Analytical Electron Microscopy ◽  
Grain Structure ◽  
Solid State Reactions ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Sputter Deposited

Solid state reactions in sputter-deposited Nb/Al multilayer thin films have been studied by transmission and analytical electron microscopy (TEM/AEM), differential scanning calorimetry (DSC) and X-ray diffraction (XRD). The Nb/Al multilayer thin films for TEM studies were sputter-deposited on (1102)sapphire substrates. The periodicity of the films is in the range 10-500 nm. The overall composition of the films are 1/3, 2/1, and 3/1 Nb/Al, corresponding to the stoichiometric composition of the three intermetallic phases in this system.Figure 1 is a TEM micrograph of an as-deposited film with periodicity A = dA1 + dNb = 72 nm, where d's are layer thicknesses. The polycrystalline nature of the Al and Nb layers with their columnar grain structure is evident in the figure. Both Nb and Al layers exhibit crystallographic texture, with the electron diffraction pattern for this film showing stronger diffraction spots in the direction normal to the multilayer. The X-ray diffraction patterns of all films are dominated by the Al(l 11) and Nb(l 10) peaks and show a merging of these two peaks with decreasing periodicity.

Sign in / Sign up

Export Citation Format

Share Document