See-through three-dimensional screen using holographic optical elements

Author(s):  
Byoungho Lee ◽  
Jiwoon Yeom ◽  
Keehoon Hong
2014 ◽  
Vol 22 (12) ◽  
pp. 14363 ◽  
Author(s):  
Keehoon Hong ◽  
Jiwoon Yeom ◽  
Changwon Jang ◽  
Gang Li ◽  
Jisoo Hong ◽  
...  

Photonics ◽  
2021 ◽  
Vol 8 (8) ◽  
pp. 297
Author(s):  
Qinglin Ji ◽  
Huan Deng ◽  
Hanle Zhang ◽  
Wenhao Jiang ◽  
Feiyan Zhong ◽  
...  

An optical see-through two-dimensional (2D)/three-dimensional (3D) compatible display using variable-focus lens and multiplexed holographic optical elements (MHOE) is presented. It mainly consists of a MHOE, a variable-focus lens and a projection display device. The customized MHOE, by using the angular multiplexing technology of volumetric holographic grating, records the scattering wavefront and spherical wavefront array required for 2D/3D compatible display. In particular, we proposed a feasible method to switch the 2D and 3D display modes by using a variable-focus lens in the reconstruction process. The proposed system solves the problem of bulky volume, and makes the MHOE more efficient to use. Based on the requirements of 2D and 3D displays, we calculated the liquid pumping volume of the variable-focus lens under two kinds of diopters.


2015 ◽  
Vol 55 (3) ◽  
pp. A71 ◽  
Author(s):  
Changwon Jang ◽  
Chang-Kun Lee ◽  
Jinsoo Jeong ◽  
Gang Li ◽  
Seungjae Lee ◽  
...  

2015 ◽  
Author(s):  
Hirofumi Yabu ◽  
Yusuke Takeuchi ◽  
Kayo Yoshimoto ◽  
Hideya Takahashi ◽  
Kenji Yamada

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.


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