Large refractive index changes of a chemically amplified photoresist in femtosecond laser nonlinear lithography
2011 ◽
Vol 19
(8)
◽
pp. 7673
◽
Mizue Mizoshiri
◽
Yoshinori Hirata
◽
Junji Nishii
◽
Hiroaki Nishiyama
2015 ◽
Vol 23
(12)
◽
pp. 15343
◽
Muhammad Ali Butt
◽
Huu-Dat Nguyen
◽
Airán Ródenas
◽
Carolina Romero
◽
Pablo Moreno
◽
...
D. K. Y. Low
◽
H. Qiu
◽
Z. Xiong
◽
G. C. Lim
2001 ◽
Vol 26
(1)
◽
pp. 19
◽
Kazuhiro Yamada
◽
Wataru Watanabe
◽
Tadamasa Toma
◽
Kazuyoshi Itoh
◽
Junji Nishii
2014 ◽
Vol 39
(12)
◽
pp. 3398
◽
Juha-Matti Savolainen
◽
Lars Grüner-Nielsen
◽
Poul Kristensen
◽
Peter Balling
2016 ◽
Vol 9
(11)
◽
pp. 941
Akram Saad
◽
Yonghyun Cho
◽
Farid Ahmed
◽
Martin Jun
Lin Zhang
◽
Jiamin Liu
◽
Zhicheng Zhong
◽
Hao Jiang
◽
Honggang Gu
◽
...
S. Juodkazis
◽
E.G. Gamaly
◽
V. Mizeikis
◽
H. Misawa
◽
A.V. Rode
◽
...
2012 ◽
Vol 37
(14)
◽
pp. 3003
◽
René Berlich
◽
Jiyeon Choi
◽
Clarisse Mazuir
◽
Winston V. Schoenfeld
◽
Stefan Nolte
◽
...
2014 ◽
Vol 31
(7)
◽
pp. 1676
◽
J. Hernandez-Rueda
◽
J. Siegel
◽
M. Garcia-Lechuga
◽
J. Solis
2008 ◽
Vol 354
(12-13)
◽
pp. 1216-1220
◽
Yigang Li
◽
Zian He
◽
Hengsheng Tang
◽
Liying Liu
◽
Lei Xu
◽
...