Exploring the unlimited possibilities of modular aspheric Gauss to top-hat beam shaping

2016 ◽  
Vol 5 (3) ◽  
Author(s):  
Anna Möhl ◽  
Ulrike Fuchs

AbstractBeam shaping is a field of research with growing importance. Therefore, a new refractive beam shaping system is presented. The knowledge gained from analyzing patent systems was used to derive our own improved design. It is compared to a patent system, and some selected results are presented in this work. Furthermore, possibilities to scale the entrance and exit beam diameters with the help of SPA™ Beam Expander Kit and SPA™ AspheriColl (both from asphericon GmbH, Jena, Germany) are shown, so that a modular top-hat generation is achievable. Additionally, the large spectral range in which the beam shaping system is applicable is demonstrated, and it is demonstrated how the beam shaping system can be used to improve the performance of other optical elements that require a top-hat beam profile.

Author(s):  
Simran Agarwal ◽  
Romuald Jolivot ◽  
Waleed S. Mohammed

In the recent years, many different techniques and algorithms have been devised to design diffractive optical elements (DOE’s) for the purpose of beam shaping. This paper demonstrates an approach to realise a 3-D printed radial phase mask to be used in beam shaping to achieve a beam profile closer to the flattop. An iterative algorithm approach is employed to simulate the phase masks in greyscale and subsequently into STL format. These 3-D printed masks are used as an optical element and characterised using an experimental setup. The images of the light after the characterisation are examined and compared with the simulated results. Therefore, this method reduces the complexity as 3-D printing the masks eliminates the need for fabrication, processing time and number of components necessary to obtain a flattop beam profile.


Author(s):  
Gaétan de Rassenfosse ◽  
William E Griffiths ◽  
Adam B Jaffe ◽  
Elizabeth Webster

Abstract A low-quality patent system threatens to slow the pace of technological progress. Concerns about low patent quality are supported by estimates from litigation studies suggesting that most US patents granted should not have been issued. We propose a new model for measuring patent quality, based on equivalent patent applications submitted to multiple offices. Our method allows us to distinguish whether low-quality patents are issued because an office implements a low standard or because it violates its own standard. The results suggest that quality in patent systems is higher than previously thought. Specifically, the percentage of granted patents that are below each office’s own standard is under 10% for all offices. The Japanese patent office has a higher percentage of granted patents below its own standard than those from Europe, the USA, Korea, and China. This result arises from the fact that Japan has a higher standard than other offices. (JEL O34, K2, L4, F42)


1991 ◽  
Author(s):  
J. A. MacAndrew ◽  
Mark R. Humphries ◽  
W. T. Welford ◽  
John A. Golby ◽  
Peter H. Dickinson ◽  
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2018 ◽  
Vol 26 (20) ◽  
pp. 26385
Author(s):  
Shengqian Chang ◽  
Xiao Tao ◽  
Rengmao Wu ◽  
Yi Sun ◽  
Zhenrong Zheng

2000 ◽  
Vol 47 (13) ◽  
pp. 2421-2435 ◽  
Author(s):  
K. Ballüder ◽  
M. R. Taghizadeh ◽  
H. A. McInnes ◽  
T. H. Bett

2018 ◽  
Vol 7 (1) ◽  
Author(s):  
Felix Fries ◽  
Markus Fröbel ◽  
Pen Yiao Ang ◽  
Simone Lenk ◽  
Sebastian Reineke

2015 ◽  
Vol 35 (8) ◽  
pp. 0805001
Author(s):  
张巍 Zhang Wei ◽  
梁传样 Liang Chuanyang ◽  
李金 Li Jin ◽  
芮大为 Rui Dawei

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