Optical coatings for high-intensity femtosecond lasers

2013 ◽  
pp. 664-694
Author(s):  
V. Pervak
2021 ◽  
Author(s):  
Ulrike Wegner ◽  
Joachim Meier ◽  
Dimitrios Rompotis ◽  
Radu-Costin Secareanu ◽  
Moritz Emons ◽  
...  

1999 ◽  
Author(s):  
Sung-Hak Cho ◽  
Hiroshi Kumagai ◽  
Katsumi Midorikawa ◽  
Minoru Obara

2015 ◽  
Author(s):  
Luke A. Emmert ◽  
Cristina Rodriguez ◽  
Zhanliang Sun ◽  
Farzin Beygi Azar Aghbolagh ◽  
Stefan Günster ◽  
...  

Author(s):  
G. Chériaux ◽  
F. Druon ◽  
A. Maksimchuk ◽  
M. Nantel ◽  
G. Vdovin ◽  
...  

Author(s):  
W. Theobald ◽  
R. Häßner ◽  
R. Kingham ◽  
T. Feurer ◽  
H. Schillinger ◽  
...  

Author(s):  
George Christov ◽  
Bolivar J. Lloyd

A new high intensity grid cap has been designed for the RCA-EMU-3 electron microscope. Various parameters of the new grid cap were investigated to determine its characteristics. The increase in illumination produced provides ease of focusing on the fluorescent screen at magnifications from 1500 to 50,000 times using an accelerating voltage of 50 KV.The EMU-3 type electron gun assembly consists of a V-shaped tungsten filament for a cathode with a thin metal threaded cathode shield and an anode with a central aperture to permit the beam to course the length of the column. The cathode shield is negatively biased at a potential of several hundred volts with respect to the filament. The electron beam is formed by electrons emitted from the tip of the filament which pass through an aperture of 0.1 inch diameter in the cap and then it is accelerated by the negative high voltage through a 0.625 inch diameter aperture in the anode which is at ground potential.


2006 ◽  
Vol 175 (4S) ◽  
pp. 86-86
Author(s):  
Makoto Sumitomo ◽  
Junichi Asakuma ◽  
Yasumasa Hanawa ◽  
Kazuhiko Nagakura ◽  
Masamichi Hayakawa

2005 ◽  
Vol 173 (4S) ◽  
pp. 379-380
Author(s):  
James E. Kennedy ◽  
Rowland O. Illing ◽  
Feng Wu ◽  
Gail R. ter Haar ◽  
Rachel R. Phillips ◽  
...  

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