scholarly journals On-chip Neural Cell Cultivation using Agarose-microchamber Array constructed by Photo-thermal Etching Method

2002 ◽  
Vol 122 (9) ◽  
pp. 1453-1458
Author(s):  
Hiroyuki Moriguchi ◽  
Kazunori Takahashi ◽  
Yoshihiro Sugio ◽  
Yuichi Wakamto ◽  
Ippei Inoue ◽  
...  
Keyword(s):  
Neural Cell ◽  
Cell Cultivation ◽  
Thermal Etching ◽  
Etching Method ◽  
On Chip

On-chip neural cell cultivation using agarose-microchamber array constructed by a photothermal etching method

2003 ◽  
Vol 146 (2) ◽  
pp. 37-42 ◽  
Author(s):  
Hiroyuki Moriguchi ◽  
Kazunori Takahashi ◽  
Yoshihiro Sugio ◽  
Yuichi Wakamoto ◽  
Ippei Inoue ◽  
...  
Keyword(s):  
Neural Cell ◽  
Cell Cultivation ◽  
Etching Method ◽  
On Chip

An agar-based on-chip neural-cell-cultivation system for stepwise control of network pattern generation during cultivation

2004 ◽  
Vol 99 (1) ◽  
pp. 156-162 ◽  
Author(s):  
Yoshihiro Sugio ◽  
Kensuke Kojima ◽  
Hiroyuki Moriguchi ◽  
Kazunori Takahashi ◽  
Tomoyuki Kaneko ◽  
...  
Keyword(s):  
Neural Cell ◽  
Pattern Generation ◽  
Cell Cultivation ◽  
Cultivation System ◽  
On Chip ◽  
Network Pattern

On-Chip Neural Cell-Cultivation System for Long-Term Observation with Multi-Electrode and Microchamber Arrays

2002 ◽  
pp. 841-843
Author(s):  
Kazunori Takahashi ◽  
Yoshihiro Sugio ◽  
Hiroyuki Moriguchi ◽  
Yasuhiko Jimbo ◽  
Kenji Yasuda
Keyword(s):  
Neural Cell ◽  
Cell Cultivation ◽  
Cultivation System ◽  
On Chip ◽  
Long Term Observation

Sloped Sidewalls in 4H-SiC Mesa Structure Formed by a Cl2-O2 Thermal Etching

2007 ◽  
Vol 556-557 ◽  
pp. 733-736 ◽  
Author(s):  
S. Takenami ◽  
Tomoaki Hatayama ◽  
Hiroshi Yano ◽  
Yukiharu Uraoka ◽  
Takashi Fuyuki
Keyword(s):  
Electrical Properties ◽  
Etching Rate ◽  
Mesa Structure ◽  
Thermal Etching ◽  
Etching Method ◽  
Pn Junction ◽  
Etched Surface

Sloped sidewalls in 4H-SiC mesa structures on the (000-1) C face were formed by a Cl2-O2 thermal etching method. The etching rate of 4H-SiC (000-1) C face was 10 times faster than that of (0001) Si face, and the etching rate at 910oC was about 18μm/h. The etched surface was rather smooth, and the sidewall of the mesa was inclined to the off-axis substrate. Taking into account the off angle of about 8o toward [11-20] off direction, the angles of the sidewalls were 52-56o for the <1-100> and 55-57o for the <11-20> directions from the crystallographically accurate (000-1) C face. Epitaxial pn junction diodes with the sloped sidewalls structure were fabricated, which had good electrical properties.

An agar-microchamber cell-cultivation system: flexible change of microchamber shapes during cultivation by photo-thermal etching

Lab on a Chip ◽  
2002 ◽  
Vol 2 (2) ◽  
pp. 125 ◽  
Author(s):  
Hiroyuki Moriguchi ◽  
Yuichi Wakamoto ◽  
Yoshihiro Sugio ◽  
Kazunori Takahashi ◽  
Ippei Inoue ◽  
...  
Keyword(s):  
Cell Cultivation ◽  
Cultivation System ◽  
Thermal Etching

Measurement of Incident Angle Dependence of Swimming Bacterium Reflection Using On-Chip Single-Cell Cultivation Assay

2003 ◽  
Vol 42 (Part 2, No. 7B) ◽  
pp. L873-L875 ◽  
Author(s):  
Akihiro Hattori ◽  
Senkei Umehara ◽  
Yuichi Wakamoto ◽  
Kenji Yasuda
Keyword(s):  
Single Cell ◽  
Incident Angle ◽  
Cell Cultivation ◽  
Angle Dependence ◽  
On Chip
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