Characteristics of ultraviolet-assisted pulsed-laser-deposited Y2O3 thin films
2000 ◽
Vol 15
(2)
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pp. 488-494
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Keyword(s):
The properties of thin Y2O3 films grown using an in situ ultraviolet (UV)-assisted pulsed laser deposition (PLD) technique were studied. With respect to Y2O3 films grown by conventional PLD under similar conditions but without UV illumination, the UVPLD-grown films exhibited better structural and optical properties, especially for lower substrate temperatures, from 340 to 400 °C. These layers were highly crystalline and textured along the (111) direction, and their refractive index values were similar to those of reference Y2O3 layers. They also exhibited a better stoichiometry and contained less physisorbed oxygen than the conventional PLD-grown layers.
2009 ◽
Vol 113
(1)
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pp. 130-134
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2014 ◽
Vol 25
(11)
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pp. 5071-5077
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2007 ◽
Vol 59
◽
pp. 724-727
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2002 ◽
Vol 419
(1-2)
◽
pp. 237-241
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2014 ◽
Vol 534
◽
pp. 012047
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