Evaluation of Crack Growth Retardation Effect Due to Nano-scale Voids Based on Molecular Dynamics Method
Keyword(s):
ABSTRACTThis study has investigated the crack growth retardation effect due to plural nano-scale voids in Cu single crystals using a molecular dynamics (MD) method. Focusing on an interaction between nano-scale voids and dislocations, we have evaluated the optimum placement for crack growth retardation. MD simulations showed that the dislocation activity was further enhanced due to plural nano-scale voids continuously placed on the primary slip direction. The significant ductility enhancement and slight yield stress increase due to the crack shielding effect of nano-scale voids were observed.
2010 ◽
Vol 2010.18
(0)
◽
pp. 17-18
◽
1991 ◽
Vol 113
(4)
◽
pp. 556-559
◽
Keyword(s):
2017 ◽
2004 ◽
Vol 29
(4)
◽
pp. 446-452
◽
Keyword(s):
1991 ◽
Vol 26
(20)
◽
pp. 5613-5617
◽
Keyword(s):
1989 ◽
pp. 803-808
◽
Keyword(s):
1989 ◽
pp. 1349-1356
Keyword(s):
2014 ◽
Vol 891-892
◽
pp. 948-954
◽